The paper summarizes current knowledge of growth defects in physical vapor deposition (PVD) coatings. A detailed historical overview is followed by a description of the types and evolution of growth defects. Growth defects are microscopic imperfections in the coating microstructure. They are most commonly formed by overgrowing of the topographical imperfections (pits, asperities) on the substrate surface or the foreign particles of different origins (dust, debris, flakes). Such foreign particles are not only those that remain on the substrate surface after wet cleaning procedure, but also the ones that are generated during ion etching and deposition processes. Although the origin of seed particles from external pretreatment of substrate is similar to all PVD coatings, the influence of ion etching and deposition techniques is rather different. Therefore, special emphasis is given on the description of the processes that take place during ion etching of substrates and the deposition of coating. The effect of growth defects on the functional properties of PVD coatings is described in the last section. How defects affect the quality of optical coatings, thin layers for semiconductor devices, as well as wear, corrosion, and oxidation resistant coatings is explained. The effect of growth defects on the permeation and wettability of the coatings is also shortly described.

中文翻译：

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PVD技术制备薄膜的生长缺陷综述

的 论文总结了有关物理气相沉积（PVD）涂层中生长缺陷的最新知识。详细的历史概述之后，将描述生长缺陷的类型和演变。生长缺陷是涂层微观结构中的微观缺陷。它们最常见的原因是基材表面上的地形缺陷（凹坑，凹凸不平）或不同来源的异物（灰尘，碎屑，薄片）过度生长。这样的异物不仅是在湿法清洁程序之后残留在基板表面上的那些，而且还是在离子蚀刻和沉积过程中产生的那些。尽管来自外部基材预处理的种子颗粒起源与所有PVD涂层相似，但离子蚀刻和沉积技术的影响却大不相同。因此，特别强调对基板离子蚀刻和涂层沉积过程中发生的过程的描述。上一节介绍了生长缺陷对PVD涂层功能特性的影响。解释了缺陷如何影响光学涂层，半导体器件薄层以及耐磨，腐蚀和抗氧化涂层的质量。还简短地描述了生长缺陷对涂层渗透性和润湿性的影响。解释了半导体器件的薄层以及耐磨，腐蚀和抗氧化涂层。还简短地描述了生长缺陷对涂层渗透性和润湿性的影响。解释了半导体器件的薄层以及耐磨，腐蚀和抗氧化涂层。还简短地描述了生长缺陷对涂层渗透性和润湿性的影响。