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Effectiveness of PECVD deposited nano-silicon oxide protective layer for polylactic acid film: Barrier and surface properties
Food Packaging and Shelf Life ( IF 8 ) Pub Date : 2020-09-01 , DOI: 10.1016/j.fpsl.2020.100513
Yuan Zhao , Chongxing Huang , Xingqiang Huang , Haohe Huang , Hui Zhao , Shuangfei Wang , Shijie Liu

Abstract This study evaluated the effectiveness of a silicon oxide (SiOx) layer of approximately 100 nm thickness manufactured by plasma enhanced chemical vapor deposition (PECVD) as a protective coating for PLA-based films to reduce the corrosion and contaminant migration caused by food contact. The migration kinetics of plasticizer diethylene glycol dibenzoate (DEDB) in the films and the barrier and surface properties of films were studied. Results indicated that compared to PLA-based films, the final DEDB migration amount of SiOx/PLA-coated films was reduced by 23.75-36.90% in food simulants A, B, C and D1, while the time to reach migration equilibrium was prolonged. SiOx layer increased the static water contact angle of the PLA film from 85.5 ± 0.4° to 101.8 ± 1.2° and decreased the oxygen and water vapor transmission rates by 48.45% and 28.53%, respectively. The nanostructured SiOx barrier layer was effective in protecting the shape and transparency of the coated films.

中文翻译:

PECVD沉积纳米氧化硅保护层对聚乳酸薄膜的有效性:阻隔和表面特性

摘要 本研究评估了通过等离子体增强化学气相沉积 (PECVD) 制造的约 100 nm 厚度的氧化硅 (SiOx) 层作为 PLA 基薄膜的保护涂层的有效性,以减少由食品接触引起的腐蚀和污染物迁移。研究了增塑剂二甘醇二苯甲酸酯(DEDB)在薄膜中的迁移动力学以及薄膜的阻隔和表面性能。结果表明,与 PLA 基薄膜相比,SiOx/PLA 涂层薄膜在食品模拟物 A、B、C 和 D1 中的最终 DEDB 迁移量降低了 23.75-36.90%,同时达到迁移平衡的时间延长。SiOx 层将 PLA 薄膜的静态水接触角从 85.5 ± 0.4° 增加到 101.8 ± 1.2°,并将氧气和水蒸气透过率降低了 48.45% 和 28。分别为 53%。纳米结构的 SiOx 阻挡层可有效保护涂层薄膜的形状和透明度。
更新日期:2020-09-01
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