Boron nitride (BN) nanosheets incorporated silica antireflective (AR) coating was successfully prepared on fused silica substrate to improve the antilaser-damage ability of transmissive optics used in high-power laser systems. The BN nanosheets were obtained by urea assisted solid exfoliation, and then incorporated into basic-catalyzed silica sols without any further treatment. The transmission electron microscope (TEM) images indicated that the BN nanosheets generally consisted of 2–10 layers. The antireflective BN/$\text{SiO}_{2}$ coating exhibited excellent transmittance as high as 99.89% at 351 nm wavelength on fused silica substrate. The thermal conductivity $0.135~\text{W}\cdot \text{m}^{-1}\cdot \text{K}^{-1}$ of the BN/$\text{SiO}_{2}$ coating with 10% BN addition was about 23% higher than $0.11~\text{W}\cdot \text{m}^{-1}\cdot \text{K}^{-1}$ of the pure $\text{SiO}_{2}$ AR coating. The laser-induced damage threshold (LIDT) of that BN/$\text{SiO}_{2}$ coating is also 23.1% higher than that of pure $\text{SiO}_{2}$ AR coating. This research provides a potential application of BN/$\text{SiO}_{2}$ coatings in high-power laser systems.

中文翻译：

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六方氮化硼纳米片包含具有增强的激光诱导损伤阈值的抗反射二氧化硅涂层

在熔融石英基底上成功制备了掺有二氧化硅抗反射 (AR) 涂层的氮化硼 (BN) 纳米片，以提高高功率激光系统中使用的透射光学器件的抗激光损伤能力。BN纳米片通过尿素辅助固体剥离获得，然后在没有任何进一步处理的情况下掺入碱性催化二氧化硅溶胶中。透射电子显微镜 (TEM) 图像表明，BN 纳米片通常由 2-10 层组成。抗反射BN/$\文本{SiO}_{2}$涂层在熔融石英基材上在 351 nm 波长下表现出高达 99.89% 的出色透射率。导热系数$0.135~\text{W}\cdot \text{m}^{-1}\cdot \text{K}^{-1}$国阵/$\文本{SiO}_{2}$添加 10% BN 的涂层比涂层高约 23%$0.11~\text{W}\cdot \text{m}^{-1}\cdot \text{K}^{-1}$纯粹的$\文本{SiO}_{2}$增透膜。该BN /的激光诱导损伤阈值（LIDT）$\文本{SiO}_{2}$涂层也比纯涂层高23.1%$\文本{SiO}_{2}$增透膜。该研究提供了BN /的潜在应用$\文本{SiO}_{2}$高功率激光系统中的涂层。