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Back‐End‐of‐Line Compatible Low‐Temperature Furnace Anneal for Ferroelectric Hafnium Zirconium Oxide Formation
Physica Status Solidi (A) - Applications and Materials Science ( IF 2 ) Pub Date : 2020-04-27 , DOI: 10.1002/pssa.202070030 David Lehninger 1 , Ricardo Olivo 1 , Tarek Ali 1 , Maximilian Lederer 1 , Thomas Kämpfe 1 , Clemens Mart 1 , Kati Biedermann 1 , Kati Kühnel 1 , Lisa Roy 1 , Mahsa Kalkani 1 , Konrad Seidel 1
Physica Status Solidi (A) - Applications and Materials Science ( IF 2 ) Pub Date : 2020-04-27 , DOI: 10.1002/pssa.202070030 David Lehninger 1 , Ricardo Olivo 1 , Tarek Ali 1 , Maximilian Lederer 1 , Thomas Kämpfe 1 , Clemens Mart 1 , Kati Biedermann 1 , Kati Kühnel 1 , Lisa Roy 1 , Mahsa Kalkani 1 , Konrad Seidel 1
Affiliation
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Hafnium Zirconium Oxide Films
中文翻译：
用于铁电Ha氧化锆形成的后端兼容的低温炉退火
Ox氧化锆薄膜
更新日期：2020-04-27
中文翻译：
用于铁电Ha氧化锆形成的后端兼容的低温炉退火
Ox氧化锆薄膜
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