Herein, the hydrothermally derived, multilayered nanoscale WS₂ subjected to 80 keV Xe⁺ ion irradiation with ion fluence varying in the range 1 × 10¹⁵–5 × 10¹⁶ ions cm⁻² is reported. Transmission electron microscopy (TEM) imaging analysis reveals adequate splitting of stacks and consequent development of several layer sheets. Interestingly, the atomic force microscopy (AFM) studies exhibit several hillocks and craters in the postirradiated WS₂, thereby enhancing the overall surface roughness (R_q) of specimens. Typically, R_q varies in the range 101–211 nm due to ion impact. This does not only influence the nature of visible emission features in the photoluminescence (PL) spectra but also Stoke's shift, suggesting strong electron–phonon coupling after radiation exposure. Moreover, Raman spectra of the studied systems reveal noticeable blue‐shifting of the Raman‐active E¹_2g and A_1g modes and also remarkable improvement in the E¹_2g‐to‐A_1g intensity ratio, ranging from 0.72 to 0.87. Finally, contact angle measurements carried out on specimen surfaces show a clear transition from the hydrophilic to hydrophobic behavior due to the irradiation‐induced increased surface roughness feature. The study can offer immense scope in components relevant to nano‐electromechanics, self‐cleaning, and nanocoatings and also where the switchable bifunctional property is invariably desired.

中文翻译：

---

由于能量Xe +离子分裂WS2纳米片而导致的粗糙度增加介导了可观察到的振动模式，可见光发光和去湿响应

在本文中，报道了水热衍生的多层纳米级WS ₂受到80 keV Xe ⁺离子辐照，离子通量在1×10 ¹⁵ –5×10 ¹⁶ 离子cm ^-2范围内变化。透射电子显微镜（TEM）成像分析揭示了堆栈的充分分裂，并因此形成了几层板。有趣的是，原子力显微镜（AFM）研究在后辐照的WS _2中显示出几个小丘和凹坑，从而提高了样品的整体表面粗糙度（R _q）。通常，R _q由于离子撞击，在101-211 nm范围内变化。这不仅影响光致发光（PL）光谱中可见光发射特征的性质，而且还影响斯托克频移，这表明辐射暴露后电子与声子的强耦合。此外，研究系统的拉曼光谱显示了拉曼活性E ¹ _2g和A _1g模式的明显蓝移，以及E ¹ _2g到A _1g的显着改善。强度比，范围从0.72到0.87。最后，由于辐照引起的表面粗糙度增加，在样品表面进行的接触角测量显示出从亲水性到疏水性的清晰过渡。这项研究可以为与纳米机电学，自清洁和纳米涂层有关的组件提供广阔的范围，同时也始终需要可切换的双功能特性。