An X‐ray photoelectron spectroscopy (XPS) instrument is utilized for sputter depth profiling of thin films. Relevant instrumental parameters are the ion gun sputter rate, the contamination level of the sputter ion gun, and the purity of the sputter ion gun gas supply as well as the vacuum quality of the instrument at the sample position. A long‐term recording of these instrumental parameters ensures the reliability of the measured depth profile data.

中文翻译：

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XPS深度分析仪的离子溅射相关参数状态监控

X射线光电子能谱（XPS）仪器用于薄膜的溅射深度分析。相关的仪器参数包括离子枪溅射速率，溅射离子枪的污染水平，溅射离子枪供气的纯度以及样品位置处仪器的真空质量。长期记录这些仪器参数可确保测得的深度剖面数据的可靠性。