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Numerical analysis of chemical reaction processes in different anode attachments of a high‐intensity argon arc
Contributions to Plasma Physics ( IF 1.3 ) Pub Date : 2019-12-05 , DOI: 10.1002/ctpp.201900094
Su-Rong Sun 1 , Hai-Xing Wang 1 , Tao Zhu 1
Affiliation  

The attachment mode of arc on anode is closely related to the non‐equilibrium chemical kinetics process of the anode region of arc. In this paper, the detailed chemical reaction mechanisms in the flow‐affected region for both diffuse and constricted argon arc attachments are investigated by means of one‐dimensional discharge coupled with a single‐fluid, two‐temperature model. The collisional‐radiative model is used to examine the chemical reaction processes occurring in the anode region, including the arc centreline and fringe region. The numerical results are validated by comparison with available experimental data. The obtained radial distributions of electron temperature, electron density, excited states densities, ionization, and recombination processes reveal that different mechanisms dominate the diffuse and constricted arc‐anode attachments.

中文翻译:

高强度氩弧焊不同阳极附件化学反应过程的数值分析

电弧在阳极上的附着方式与电弧阳极区域的非平衡化学动力学过程密切相关。在本文中,通过一维放电和单流体,两温度模型研究了扩散和压缩氩弧附件在受流影响区域的详细化学反应机理。碰撞辐射模型用于检查阳极区域(包括电弧中心线和边缘区域)中发生的化学反应过程。通过与可用的实验数据进行比较来验证数值结果。获得的电子温度,电子密度,激发态密度,电离和复合过程的径向分布表明,不同的机理主导着弥散和收缩的弧阳极附着。
更新日期:2019-12-05
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