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Study of multiple impurity seeding effect using SONIC integrated divertor code for JT‐60SA plasma prediction
Contributions to Plasma Physics ( IF 1.3 ) Pub Date : 2019-12-25 , DOI: 10.1002/ctpp.201900146
Shohei Yamoto 1 , Kazuo Hoshino 2 , Yuki Homma 3 , Tomohide Nakano 1 , Nobuhiko Hayashi 1
Affiliation  

In order to study the potential impurity seeding operation regime of the future fusion devices, the first application of the integrated divertor code SONIC to the Ar + Ne mixed‐impurity seeding operation of JT‐60SA steady‐state high‐β plasma has been carried out. In the case, Ne is added to Ar‐only seeding, the separatrix electron density has fell into the desired low separatrix electron density of the scenario. This is mainly because the D+ flow velocity towards the inner divertor has been increased by the Ne seeding. The resultant friction force transports Ar impurities towards the inner divertor region, while impurities are stagnated in the top of scrape‐off layer (SOL) in the Ar‐only seeding case. The higher impurity radiation power in the divertor regions and lower one in the SOL region above the X point have been obtained in mixed‐impurity seeding cases, which show similar tendency as the Ar + Ne mixed‐impurity seeding experiment in JT‐60 U. At the core edge, Zeff has been slightly increased and the radiation power has been decreased as the Ne seeding rate increases. The core plasma/impurity transport has been also evaluated by the TOPICS code using the impurity density at the core edge computed by the SONIC as a boundary parameter. The results show lower Zeff and radiation power, and higher electron temperature in the core in the mixed‐impurity seeding cases. Above possible contributors to the better energy confinement indicate that the mixed‐impurity seeding operation might be more effective than Ar‐only seeding operation.

中文翻译:

使用SONIC集成偏滤器代码对JT-60SA等离子体预测的多种杂质注入效应的研究

为了研究未来聚变装置的潜在杂质注入操作方式,已将集成分流器代码SONIC首次应用于JT-60SA稳态高β等离子体的Ar + Ne混合杂质注入操作中。在这种情况下,将Ne添加到仅Ar的晶种中,则隔层电子密度已降至该方案所需的低隔层电子密度。这主要是因为D +Ne播种增加了流向内部分流器的流速。产生的摩擦力将Ar杂质向内部偏滤器区域传输,而在仅Ar播种的情况下,杂质滞留在刮除层(SOL)的顶部。在混合杂质注入的情况下,在偏滤器区域获得了较高的杂质辐射功率,而在X点以上的SOL区域则获得了较低的杂质辐射功率,与JT-60 U中的Ar + Ne混合杂质注入实验显示出相似的趋势。在核心边缘,Z eff随着Ne播种率的增加,辐射强度略有增加,辐射功率降低。核心等离子体/杂质传输也已通过TOPICS代码进行了评估,使用了SONIC计算出的核心边缘处的杂质密度作为边界参数。结果表明,在混合杂质注入情况下,较低的Z eff和辐射功率以及较高的核心电子温度。以上可能对更好的能量限制做出贡献的因素表明,混合杂质种子播种操作可能比纯Ar种子播种操作更有效。
更新日期:2019-12-25
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