A simplified numerical model to simulate plasma occurring in a magnetron sputtering device is presented. Motions and collisions of charged gas particles are modeled by the direct simulation Monte Carlo (DSMC) method on an adaptive Cartesian mesh structure. An electromagnetic (EM) field equation is solved by the finite volume method, a discretization method. The potential of the EM field influences the charged gas particles calculated by DSMC through a simplified form of non-Sibson interpolation scheme developed in this article. The DSMC, EM field solver, and interpolation module are validated separately, and integrated calculations are applied to a test scenario in a magnetron sputtering experiment. Although simulation is performed without plasma calculation, the erosion rates obtained from the simulation agreed well with experimental data, with less than 10% difference. The proposed model is expected to be used in real plasma applications, especially for calculations of erosion and deposition rates without rigorous plasma calculation.

中文翻译：

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使用蒙特卡罗和有限体积方法对与电磁场耦合的带电气体粒子进行简化建模

提出了一个简化的数值模型来模拟发生在磁控溅射装置中的等离子体。带电气体粒子的运动和碰撞通过自适应笛卡尔网格结构上的直接模拟蒙特卡罗 (DSMC) 方法进行建模。电磁（EM）场方程通过有限体积法（一种离散化方法）求解。EM 场的电位会影响 DSMC 通过本文开发的非 Sibson 插值方案的简化形式计算的带电气体粒子。DSMC、电磁场求解器和插值模块分别进行验证，集成计算应用于磁控溅射实验中的测试场景。虽然模拟没有进行等离子体计算，但模拟得到的侵蚀率与实验数据吻合良好，相差不到 10%。所提出的模型预计将用于实际的等离子体应用，特别是在没有严格等离子体计算的情况下计算侵蚀和沉积速率。