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Ni2P‐Modified Ta3N5 and TaON for Photocatalytic Nitrate Reduction
ChemNanoMat ( IF 2.6 ) Pub Date : 2020-05-19 , DOI: 10.1002/cnma.202000174
Lin Wei 1 , Marquix A. S. Adamson 1 , Javier Vela 1, 2
Affiliation  

Self‐sustaining photocatalytic NO3 reduction systems could become ideal NO3 removal methods. Developing an efficient, highly active photocatalyst is the key to the photocatalytic reduction of NO3. In this work, we present the synthesis of Ni2P‐modified Ta3N5 (Ni2P/Ta3N5), TaON (Ni2P/TaON), and TiO2 (Ni2P/TiO2). Starting with a 2 mM (28 g/mL NO3−N) aqueous solution of NO3, as made Ni2P/Ta3N5 and Ni2P/TaON display as high as 79% and 61% NO3 conversion under 419 nm light within 12 h, which correspond to reaction rates per gram of 196 μmol g−1 h−1 and 153 μmol g−1 h−1, respectively, and apparent quantum yields of 3–4%. Compared to 24% NO3 conversion in Ni2P/TiO2, Ni2P/Ta3N5 and Ni2P/TaON exhibit higher activities due to the visible light active semiconductor (SC) substrates Ta3N5 and TaON. We also discuss two possible electron migration pathways in Ni2P/semiconductor heterostructures. Our experimental results suggest one dominant electron migration pathway in these materials, namely: Photo‐generated electrons migrate from the semiconductor to co‐catalyst Ni2P, and upshift its Fermi level. The higher Fermi level provides greater driving force and allows NO3 reduction to occur on the Ni2P surface.

中文翻译:

Ni2P改性的Ta3N5和TaON用于光催化硝酸盐还原

自我维持的光催化NO 3 -还原系统可能成为理想的NO 3 -去除方法。开发有效的,高活性的光催化剂的关键是光催化还原NO的3 - 。在这项工作中,我们介绍了Ni 2 P改性的Ta 3 N 5(Ni 2 P / Ta 3 N 5),TaON(Ni 2 P / TaON)和TiO 2(Ni 2 P / TiO 2)的合成。用2mM的(28微克/毫升无起始3 - NO的水溶液-N)3 - ,如由Ni2 P /钽3 Ñ 5和Ni 2 P / TAON显示高达79%和61%的NO 3 -下419纳米的光转换12小时,其内对应于每克196的反应速率微摩尔克-1  ħ -1和153μmolg -1  h -1,表观量子产率为3-4%。相比24%的NO 3 -转化以Ni 2的TiO P / 2,镍2 P /钽3 Ñ 5和Ni 2 P / TAON由于可见光活性半导体(SC)表现出更高的活性基片的Ta 3N 5和TaON。我们还讨论了Ni 2 P /半导体异质结构中的两种可能的电子迁移途径。我们的实验结果表明,这些材料中有一个主要的电子迁移途径,即:光生电子从半导体迁移到助催化剂Ni 2 P,并上调其费米能级。较高的费米能级提供更大的驱动力,并允许NO 3 -在Ni上发生还原2 P表面。
更新日期:2020-05-19
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