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Impact of p-Type NiO Pocket and Ultra-Thin Graphene Layer on the RF Performance of β -Ga 2 O 3 MOSFET
ECS Journal of Solid State Science and Technology ( IF 1.8 ) Pub Date : 2020-04-26 , DOI: 10.1149/2162-8777/ab8b4e
Narendra Yadava , Shivangi Mani , R. K. Chauhan

In this work, the RF performance of proposed p-type NiO pocket based β -Ga 2 O 3 /graphene heterostructure MOSFET has been investigated. The figure of merits (FOMs) for its performance investigation includes transconductance (g m ), output conductance (g d ), intrinsic capacitances (gate to drain capacitance C gd and gate to source capacitance C gs ) and cut-off frequency (f T ). The large signal CW RF performance is also investigated which includes output power (P OUT ), power-added efficiency (PAE) and power gain (G p ) as a key FOMs. The key idea behind this work is to demonstrate a device with improved RF performance and low leakages. The RF characteristics of the proposed device have been studied to show its utility in the wireless applications. The introduction of ultra-thin graphene layer beneath the channel region results in 0.85 times lower C gs , 1.04 times improvement in f...

中文翻译:

p型NiO口袋和超薄石墨烯层对β-Ga 2 O 3 MOSFET射频性能的影响

在这项工作中,已经研究了建议的基于p型NiO口袋的β-Ga 2 O 3 /石墨烯异质结构MOSFET的RF性能。用于性能研究的优值指标(FOM)包括跨导(gm),输出电导(gd),固有电容(栅极至漏极电容C gd和栅极至源极电容C gs)和截止频率(f T)。还研究了大信号CW RF性能,其中包括作为关键FOM的输出功率(P OUT),功率附加效率(PAE)和功率增益(G p)。这项工作背后的关键思想是演示一种具有改善的RF性能和低泄漏的设备。已经研究了所提出设备的RF特性,以显示其在无线应用中的效用。在沟道区下方引入超薄石墨烯层的结果为0。
更新日期:2020-04-26
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