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Bilateral comparison of 1 Ω and 10 kΩ standards (ongoing BIPM key comparisons BIPM.EM-K13.a and 13.b) between the NMC A*STAR (Singapore) and the BIPM
Metrologia ( IF 2.1 ) Pub Date : 2020-04-19 , DOI: 10.1088/0026-1394/57/1a/01008
B Rolland 1 , M Stock 2 , S W Chua 3 , K H Lim 4 , E Tan 4
Affiliation  

This report gives the result of a bilateral comparison of resistance between the NMC A*STAR (Singapore) and the BIPM carried out in 2018-2019. Two 1 Ω and two 10 kΩ travelling standards belonging to the BIPM were used. The comparison was carried out with an 'A-B-A' pattern of measurements; the standards were measured first at the BIPM for a period of about two months, then for a period of about one month at the NMC A*STAR, and finally again at the BIPM. The measurand was the 4 terminal dc resistance at low power. The BIPM was the pilot laboratory, and the comparison forms part of the ongoing BIPM key comparisons BIPM.EM-K13.a (for 1 Ω) and BIPM.EM-K13b (for 10 kΩ). The results from the NMC A*STAR and the BIPM were found to be in good agreement, with a difference smaller than the relative expanded uncertainty (95% confidence, k = 2) of 0.064 × 10 −6 for 1 Ω and 0.036 × 10 −6 for 10 kΩ. == Main text To reach the main text of this...

中文翻译:

NMC A * STAR(新加坡)和BIPM之间的1Ω和10kΩ标准的双边比较(正在进行BIPM关键比较BIPM.EM-K13.a和13.b)

该报告给出了NMC A * STAR(新加坡)与BIPM在2018-2019年进行的双边抵抗力比较的结果。使用了属于BIPM的两个1Ω和两个10kΩ的行进标准。比较采用“ ABA”模式进行;这些标准首先在BIPM上进行了约两个月的测量,然后在NMC A * STAR上进行了约一个月的测量,最后在BIPM上进行了测量。被测量的是低功率时的4端子直流电阻。BIPM是试验实验室,该比较是正在进行的BIPM主要比较BIPM.EM-K13.a(用于1Ω)和BIPM.EM-K13b(用于10kΩ)的一部分。NMC A * STAR和BIPM的结果非常吻合,差异小于0的相对扩展不确定性(95%置信度,k = 2)。对于1Ω为064×10 -6,对于10kΩ为0.036×10 -6。==主要文字要达到此的主要文字...
更新日期:2020-04-24
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