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Deposition of anti‐fog coatings on glass substrates using the jet of an open‐to‐air microwave argon plasma at atmospheric pressure
Plasma Processes and Polymers ( IF 2.9 ) Pub Date : 2020-04-22 , DOI: 10.1002/ppap.201900229
Antoine Durocher‐Jean 1 , Iván Rodríguez Durán 2, 3 , Siavash Asadollahi 1 , Gaétan Laroche 2, 3 , Luc Stafford 1
Affiliation  

This study reports a one‐step process for the formation of anti‐fog coatings on commercial glass substrates using the jet of an open‐to‐air microwave argon plasma at atmospheric pressure with hexamethyldisiloxane (HMDSO) as the precursor for plasma‐enhanced chemical vapor deposition. Optical microscopy and broadband light transmittance measurements revealed significant precursor fragmentation and gas phase association reactions when HMDSO was injected close to the tube outlet, resulting in powder‐like, hydrophobic, and semiopaque glass surfaces. On the contrary, injection of HMDSO close to the substrate led to smoother, homogeneous, hydrophilic, and transparent glass surfaces. In addition, transmittance measurements at 590 nm in humid air according to American Society for Testing and Materials standard tests revealed superior anti‐fogging properties to plasma‐treated glass substrates. On the basis of the optical emission and absorption spectroscopy measurements, electrons, metastable argon atoms, and hot neutral argon atoms were mostly responsible for the significant precursor fragmentation close to the tube outlet, whereas the contribution of hot neutrals and ultraviolet photons became important close to the substrate.

中文翻译:

在大气压力下使用露天微波氩等离子体喷射在玻璃基板上沉积防雾涂层

这项研究报告了在大气压力下使用六甲基二硅氧烷(HMDSO)作为等离子体增强化学蒸气的前体的露天微波氩等离子体射流,在商用玻璃基板上形成防雾涂层的一步法过程。沉积。光学显微镜和宽带光透射率测量显示,当将HMDSO注入试管出口附近时,显着的前体裂解和气相缔合反应,导致粉末状,疏水性和半透明玻璃表面。相反,在靠近基材的位置注入HMDSO会导致玻璃表面更光滑,均匀,亲水和透明。此外,根据美国测试和材料协会标准测试,在潮湿空气中590 nm处的透射率测量显示,其抗雾化性能优于等离子处理的玻璃基板。根据光发射和吸收光谱测量,电子,亚稳态氩原子和热中性氩原子主要负责靠近管出口的显着前体碎片化,而热中性和紫外光子的贡献在接近管出口处很重要。基板。
更新日期:2020-04-22
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