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Magnetic depth profiling of the Co/C60 interface through soft X-ray resonant magnetic reflectivity
IEEE Transactions on Magnetics ( IF 2.1 ) Pub Date : 2020-05-01 , DOI: 10.1109/tmag.2020.2981927
Adriano Verna , Ilaria Bergenti , Luca Pasquali , Angelo Giglia , Cristiano Albonetti , Valentin Dediu , Francesco Borgatti

We have probed the structural and magnetic properties of a ferromagnetic/organic interface constituted by a polycrystalline Co layer deposited on a fullerene thin film through resonant soft X-ray reflectivity measurements. The fitting analysis of the reflectivity indicates the formation of a sharp interface with limited intermixing and a null remanent magnetization in a ~1 nm thick region of the Co film at the interface with C60. This information contributes to elucidate the role of organic–inorganic interfaces in the charge and spin transport inside organic spintronic devices.

中文翻译:

通过软 X 射线共振磁反射率对 Co/C60 界面进行磁性深度分析

我们已经通过共振软 X 射线反射率测量探测了由沉积在富勒烯薄膜上的多晶 Co 层构成的铁磁/有机界面的结构和磁性特性。反射率的拟合分析表明,在与 C60 的界面处,Co 膜的约 1 nm 厚区域中形成了具有有限混合和零剩磁的尖锐界面。该信息有助于阐明有机-无机界面在有机自旋电子器件内的电荷和自旋传输中的作用。
更新日期:2020-05-01
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