In this work, an improved rosin transfer process is initiated. An anisole coating is introduced based on the rosin transfer process to reduce the residue particles on the surface of transferred graphene. Rosin/graphene and anisole/rosin/graphene samples are handled without baking and with baking at different temperatures, i.e., 100 °C, 150 °C, and 200 °C. Atomic force microscopy (AFM) and Raman spectroscopy are employed to characterize the surface properties of transferred graphene. The removal of the protective rosin layer and anisole/rosin layers without baking is found to be more effective and beneficial compared to the conventional PMMA transfer process. Furthermore, better results in terms of reduced surface roughness and residue particles are accomplished by introducing anisole in the improved rosin transfer process. Uniform and low sheet resistance (Rsh) is also observed across transferred graphene using this improved process.

中文翻译：

---

一种用于减少石墨烯残留颗粒的改进的松香转移工艺。

在这项工作中，开始了改进的松香转移过程。基于松香转移过程引入了苯甲醚涂层，以减少转移的石墨烯表面上的残留颗粒。松香/石墨烯和苯甲醚/松香/石墨烯样品无需烘烤即可在不同温度（即100°C，150°C和200°C）下烘烤。原子力显微镜（AFM）和拉曼光谱用于表征转移的石墨烯的表面性质。与常规的PMMA转移方法相比，发现在没有烘烤的情况下除去保护性松香层和茴香醚/松香层是更有效和有益的。此外，通过在改进的松香转移过程中引入苯甲醚，在降低表面粗糙度和残留颗粒方面获得了更好的结果。