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Proceedings of the IEEE ( IF 23.2 ) Pub Date : 2020-04-13 , DOI: 10.1109/jproc.2020.2979196
H. -S. P. Wong , K. Akarvardar , D. Antoniadis , J. Bokor , C. Hu , T. -J. King-Liu , S. Mitra , J. D. Plummer , S. Salahuddin , L. Deng , G. Li , S. Han , L. Shi , Y. Xie , E. Yaacoub , M.-S. Alouini , A. Douik , H. Dahrouj , T. Y. Al-Naffouri , M.-S. Alouini

Since its inception, the semiconductor industry has used the physical dimension (the gate length) as a means to gauge its continuous advancement. This metric is all but obsolete today. In this month’s opinion piece, the authors examine historical trends and analyze how device technology provides for benefits at the system level, and propose a new density metric. This density metric aims to capture the essential characteristics of semiconductor technologies in a holistic way and to gauge the advances of future generations.

中文翻译:

扫描问题

自成立以来,半导体行业一直使用物理尺寸(栅极长度)作为衡量其持续发展的手段。今天,这个指标几乎已经过时了。在本月的观点文章中,作者检查了历史趋势,分析了设备技术如何在系统级别提供好处,并提出了新的密度指标。该密度指标旨在全面地把握半导体技术的基本特征,并评估子孙后代的进步。
更新日期:2020-04-22
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