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Dependence of the Compton to Rayleigh intensity ratio on the scatterer atomic number in the range of 4(Be) to 31(Ga)
X-Ray Spectrometry ( IF 1.5 ) Pub Date : 2019-09-30 , DOI: 10.1002/xrs.3117
I.F. Mikhailov 1 , A.A. Baturin 1 , A.I. Mikhailov 1 , S.S. Borisova 1 , S.V. Surovitskiy 1
Affiliation  

Compton to Rayleigh scattering intensity ratios (IC/IR) have been measured using X‐rays with energy 17.44 keV for single‐component materials with atomic number Z from 4 (Be) to 31 (Ga) and binary compounds of stoichiometric composition. The measurements have been performed using two optical schemes: an energy‐dispersive X‐ray fluorescence scheme with a molybdenum secondary target and wavelength‐dispersive X‐ray fluorescence one. The processing of the spectra was carried out by fitting with Pearson VII functions. For single‐component and binary standards, the experimental dependence of the scattering intensity ratio on the atomic number was found to be the same. This confirms the additivity of the contribution of different atoms to the scattering. The dependence has a complex shape but is well described by the theoretical relationship for IC/IR with correction on the difference between Compton and Rayleigh radiation absorption coefficients. Two ranges of atomic number values are defined, in which the effective atomic number Zeff can be determined by the calibration method using this dependence: for Z from 4 to 7 with low error of ΔZeff =±0.15 and for Zeff from 10 to 18 with low error of ΔZeff =±0.69. A change in the shape of the Compton peak and an overestimated value of the of the Compton and Rayleigh peak intensity ratio when passing from a single‐component scatterer (Al or Si) to their oxides Al2O3 or SiO2, respectively, have been revealed.

中文翻译:

康普顿与瑞利强度比与散射原子数在4(Be)至31(Ga)范围内的关系

对于原子序数为Z的单组分材料,使用能量为17.44 keV的X射线测量了康普顿散射与瑞利散射的强度比(I C / I R4(Be)至31(Ga)和化学计量组成的二元化合物。测量使用两种光学方案进行:具有钼次要靶标的能量色散X射线荧光方案和一种波长色散X射线荧光方案。光谱处理是通过与Pearson VII函数拟合进行的。对于单组分和二元标准,发现散射强度比对原子序数的实验依赖性是相同的。这证实了不同原子对散射的贡献的可加性。依存关系具有复杂的形状,但可以通过I C / I R的理论关系很好地描述校正康普顿和瑞利辐射吸收系数之间的差异。原子序数值的两个范围被定义,其中的有效原子序数Ž EFF可以通过使用这种依赖性的校准方法来确定:对于ž与Δ的低误差的4至7 ž EFF =±0.15和Ž EFF从10至18,误差ΔZ eff =±0.69。从单组分散射体(Al或Si)转移到其氧化物Al 2 O 3或SiO 2时,康普顿峰形状发生变化,康普顿峰和瑞利峰强度比的高估值分别被揭露。
更新日期:2019-09-30
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