Rate coefficients for the OH + (CH₃)₃SiCl (trimethylchlorosilane) gas‐phase reaction were measured over the temperature range 295–375 K using a pulsed laser photolysis laser‐induced fluorescence technique. The room temperature rate coefficient was determined to be k₁(295 K) = (2.51 ± 0.13) × 10⁻¹³ cm³ molecule^–1 s^–1. The Arrhenius expression k₁(T) = (7.06 ± 2.15) × 10⁻¹² exp[–(992 ± 101)/T] cm³ molecule^–1 s^–1, where the quoted uncertainties are 2σ fit precision, describes the measured temperature dependence very well. As part of this work, the infrared spectra of CH₃)₃SiCl was measured.

中文翻译：

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三甲基氯硅烷，（CH3）3SiCl：OH反应动力学和红外光谱

使用脉冲激光光解激光诱导荧光技术在295–375 K的温度范围内测量了OH +（CH ₃）₃ SiCl（三甲基氯硅烷）气相反应的速率系数。室温速率系数确定为k ₁（295 K）=（2.51±0.13）×10 ^-13 cm ³分子^–1 s ^–1。Arrhenius表达式k ₁（T）=（7.06±2.15）×10 ^-12 exp [–（992±101）/ T ] cm ³分子^–1 s ^–1，其中引用的不确定度为2σ拟合精度，很好地描述了测得的温度依赖性。作为这项工作的一部分，测量了CH ₃）₃ SiCl的红外光谱。