CF4 plasma treatment of a Teflon-like (1,1,1,2 tetrafluoroethane, TFE) chemical spray deposited on paper resulted in an increased level of elemental fluorine on the paper surface. However, TFE molecules undergo bond cleavage and ionization in the presence of the RF-CF4 plasma environment. The abundant fluorine radicals grafted onto the paper surface, via the substitution and opening of the bonds in the cellulose polymers, yielded CFx (x: 1–3) functionalities, as observed by XPS and ATR-FTIR analyses. Lower power (100 W) and treatment times (0.5 min) were sufficient to obtain very highly fluorinated surfaces. The change in the morphology of the surface by the exposure to plasma was complicated because the localized deposition and re-deposition of the plasma-generated molecules on the paper were superimposed on the surface reactions and degradation (etching) at the paper surface.

中文翻译：

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RF-CF4 等离子处理四氟乙烷预沉积纸，第 1 部分：表面反应假设

对沉积在纸上的 Teflon 类（1,1,1,2 四氟乙烷，TFE）化学喷雾进行 CF4 等离子体处理，导致纸张表面的元素氟含量增加。然而，TFE 分子在 RF-CF4 等离子体环境中会发生键断裂和电离。通过 XPS 和 ATR-FTIR 分析观察到，大量的氟自由基通过纤维素聚合物中键的取代和打开而接枝到纸表面，产生了 CFx (x: 1-3) 官能团。较低的功率 (100 W) 和处理时间 (0.5 分钟) 足以获得高度氟化的表面。