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Diffraction limited X-ray optics: technology, metrology, applications
Physics-Uspekhi ( IF 3.1 ) Pub Date : 2020-03-27 , DOI: 10.3367/ufne.2019.05.038601
Nikolai I. Chkhalo 1 , Ilya V. Malyshev 1 , Alexey E. Pestov 1 , Vladimir N. Polkovnikov 1 , Nikolai N. Salashchenko 1 , Mikhail N. Toropov 1
Affiliation  

Progress in the fabrication technology of normal incidence multilayer interference mirrors permits the traditional optical methods of microscopy, astronomy, and lithography to be transferred to the vacuum ultraviolet (VUV, wavelength: 10–200 nm) and the long-wavelength part of the soft X-ray (SXR, wavelength: 2–10 nm) ranges. Due to the short wavelength and properties of interaction with the substance, the radiation of these ranges provides unique opportunities in nanophysics, nanotechnology, and nanodiagnostics of matter. To use the potential of a short wavelength in full, diffraction-limited optical elements are required. Compared to traditional optical elements, their accuracy must be at least two orders of magnitude higher. The article provides an analysis of the real capabilities of traditional methods of making and studying precision optical elements and reports on the methods of fabrication and characterization of diffraction-limited optics for the VUV and SXR ranges devel...

中文翻译:

衍射受限的X射线光学器件:技术,计量学,应用

法向入射多层干涉镜制造技术的进步使得显微,天文学和光刻的传统光学方法可以转移到真空紫外线(VUV,波长:10–200 nm)和软X的长波部分。射线(SXR,波长:2–10 nm)范围。由于短波长和与物质相互作用的特性,这些范围的辐射为物质的纳米物理学,纳米技术和纳米诊断提供了独特的机会。为了充分利用短波长的电势,需要衍射受限的光学元件。与传统的光学元件相比,其精度必须至少高两个数量级。
更新日期:2020-04-22
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