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Interfacial Strain Gradients Control Nanoscale Domain Morphology in Epitaxial BiFeO3 Multiferroic Films
Advanced Functional Materials ( IF 18.5 ) Pub Date : 2020-04-06 , DOI: 10.1002/adfm.202000343
Daniel Sando 1, 2 , Mengjiao Han 3, 4 , Vivasha Govinden 1 , Oliver Paull 1 , Florian Appert 5 , Cécile Carrétéro 6 , Johanna Fischer 6 , Agnès Barthélémy 6 , Manuel Bibes 6 , Vincent Garcia 6 , Stéphane Fusil 6 , Brahim Dkhil 7 , Jean Juraszek 5 , Yinlian Zhu 3 , Xiuliang Ma 3 , Valanoor Nagarajan 1
Affiliation  

Domain switching pathways fundamentally control performance in ferroelectric thin film devices. In epitaxial bismuth ferrite (BiFeO3) films, the domain morphology is known to influence the multiferroic orders. While both striped and mosaic domains have been observed, the origins of the latter have remained unclear. Here, it is shown that domain morphology is defined by the strain profile across the film–substrate interface. In samples with mosaic domains, X‐ray diffraction analysis reveals strong strain gradients, while geometric phase analysis using scanning transmission electron microscopy finds that within 5 nm of the film–substrate interface, the out‐of‐plane strain shows an anomalous dip while the in‐plane strain is constant. Conversely, if uniform strain is maintained across the interface with zero strain gradient, striped domains are formed. Critically, an ex situ thermal treatment, which eliminates the interfacial strain gradient, converts the domains from mosaic to striped. The antiferromagnetic state of the BiFeO3 is also influenced by the domain structure, whereby the mosaic domains disrupt the long‐range spin cycloid. This work demonstrates that atomic scale tuning of interfacial strain gradients is a powerful route to manipulate the global multiferroic orders in epitaxial films.

中文翻译:

外延BiFeO3多铁性薄膜中的界面应变梯度控制纳米尺度域形态。

域切换路径从根本上控制铁电薄膜器件的性能。外延铋铁氧体(BiFeO 3)薄膜,其域形态已知会影响多铁性顺序。虽然已经观察到条纹域和马赛克域,但后者的起源仍不清楚。在这里,表明了畴的形态是由跨膜-基底界面的应变曲线定义的。在具有镶嵌区域的样品中,X射线衍射分析显示出很强的应变梯度,而使用扫描透射电子显微镜进行的几何相位分析发现,在膜-基底界面的5 nm范围内,平面外应变显示出异常倾角,而平面应变是恒定的。相反,如果以零应变梯度在界面上保持均匀应变,则会形成条状畴。至关重要的是,一种异位热处理可以消除界面应变梯度,将域从镶嵌转换为带状。BiFeO的反铁磁态3也受畴结构的影响,从而使镶嵌畴破坏长程自旋摆线。这项工作表明,界面应变梯度的原子尺度调节是控制外延膜中整体多铁性有序的有效途径。
更新日期:2020-04-06
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