ABSTRACT The adhesion force between two silica surfaces was measured with different experimental parameters to investigate the effect of water thin film adsorbed on the surfaces using atomic force microscopes (AFM) at various relative humidities (RH). Results show that the adhesion force behavior largely depends on a water film. Under extremely dry condition, the adhesion force is independent of contact time without a water film. With a small (large) film thickness, the adhesion force is time-dependent (time-independent) and decreases (increases) with retraction velocity, and vice versa. For repeated contacts at one location, the time-dependent adhesion force shows larger fluctuations than the time-independent one. There may be a threshold thickness of water film to distinguish time-dependent and time-independent ones. The thickness can be changed to reach a certain value via RH adjustment, with which the adhesion force is almost independent of retraction velocity, and which may be very close to the threshold value. The adhesion force behavior by adjusting RH is closely related to water film thickness instead of RH itself, since the equilibrium of vapor-film interface may be difficult to reach. These results may help facilitate the anti-adhesion design of small-scale silicon-based systems under different conditions.

中文翻译：

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水薄膜对使用 AFM 的两个二氧化硅表面之间的粘附力的影响

摘要使用不同的实验参数测量两个二氧化硅表面之间的粘附力，以研究在各种相对湿度 (RH) 下使用原子力显微镜 (AFM) 吸附在表面上的水薄膜的影响。结果表明粘附力行为很大程度上取决于水膜。在极度干燥的条件下，附着力与接触时间无关，没有水膜。对于小（大）膜厚度，粘附力与时间相关（与时间无关）并随着收缩速度减小（增加），反之亦然。对于一个位置的重复接触，与时间无关的粘附力显示出比时间无关的更大的波动。可能存在水膜的阈值厚度来区分时间相关和时间无关的水膜。可以通过RH调节改变厚度达到一定值，此时附着力几乎与回缩速度无关，可以非常接近阈值。通过调整 RH 的粘附力行为与水膜厚度而不是 RH 本身密切相关，因为可能难以达到汽膜界面的平衡。这些结果可能有助于促进不同条件下小型硅基系统的防粘连设计。