Reactive Ion Etching (RIE) of Cytop as the cladding material for optical waveguides and microfluidic channels is investigated. Different grades of Cytop (M, A and S), different mask materials including photoresist and metals, different RIE parameters, along with different substrate materials were investigated. Grass-like structure was observed at the bottom of etched channels, of height that depends on the etching process parameters. A comprehensive post-etch acid cleaning procedure was devised to effectively remove the grass structure. [2019-0232]

中文翻译：

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Cytop的反应离子蚀刻和残留微结构的研究

研究了作为光波导和微流体通道包覆材料的 Cytop 的反应离子蚀刻 (RIE)。研究了不同等级的 Cytop（M、A 和 S）、不同的掩模材料（包括光刻胶和金属）、不同的 RIE 参数以及不同的基板材料。在蚀刻通道的底部观察到草状结构，其高度取决于蚀刻工艺参数。设计了全面的蚀刻后酸清洗程序以有效去除草结构。[2019-0232]