We study the fundamental limit on the localization precision for a subwavelength scatterer embedded in a strongly scattering environment, using the external degrees of freedom provided by wavefront shaping. For a weakly scattering target, the localization precision improves with the value of the local density of states at the target position. For a strongly scattering target, the localization precision depends on the dressed polarizability that includes the backaction of the environment. This numerical study provides new insights for the control of the information content of scattered light by wavefront shaping, with potential applications in sensing, imaging, and nanoscale engineering.

中文翻译：

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局部散射环境对单粒子定位精度的影响。

我们利用波前整形提供的外部自由度，研究了嵌入强散射环境中的亚波长散射体的定位精度的基本极限。对于弱散射的目标，定位精度随目标位置处状态的局部密度值的提高而提高。对于强烈散射的目标，定位精度取决于修饰的极化率，包括环境的反作用。这项数值研究为通过波前成形控制散射光的信息含量提供了新的见识，并将其潜在地应用于传感，成像和纳米级工程中。