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Fracturing of Polycrystalline MoS2 Nanofilms
ACS Applied Electronic Materials ( IF 4.3 ) Pub Date : 2020-04-01 , DOI: 10.1021/acsaelm.0c00189 Marianna Sledzinska 1 , Gil Jumbert 1, 2 , Marcel Placidi 3 , Alois Arrighi 1, 2 , Peng Xiao 1, 2 , Francesc Alzina 1 , Clivia M. Sotomayor Torres 1, 4
ACS Applied Electronic Materials ( IF 4.3 ) Pub Date : 2020-04-01 , DOI: 10.1021/acsaelm.0c00189 Marianna Sledzinska 1 , Gil Jumbert 1, 2 , Marcel Placidi 3 , Alois Arrighi 1, 2 , Peng Xiao 1, 2 , Francesc Alzina 1 , Clivia M. Sotomayor Torres 1, 4
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The possibility of tailoring the critical strain of two-dimensional (2D) materials will be crucial for the fabrication of flexible and stretchable devices. While crystalline MoS2 monolayer shows tensile strength comparable to that of steel, a large concentration of defects and grain boundaries in polycrystalline MoS2 significantly degrades its mechanical properties. In this paper, the fracture in polycrystalline MoS2 films with an average grain size below 10 nm is studied at the micro- and nanoscale using electron microscopy. Two samples with different thicknesses and grain orientations horizontal and vertical to the sample plane are measured. The critical uniaxial strain is determined to be approximately 5% and independent of the sample morphology. However, electron beam irradiation is found to enhance the interaction between MoS2 and polydimethylsiloxane (PDMS) substrates, leading to an increased critical strain that can exceed 10%. This enhancement of strain resistance was used to fabricate a mechanically robust array of MoS2 lines 1 mm in length. Finally, nanoscale crack propagation studied by transmission electron microscopy showed that cracks propagate along the grain boundaries as well as through the grains, preferentially along van der Waals planes. These results provide insight into the fracture of polycrystalline 2D materials and a method to enhance the critical strain.
中文翻译：
多晶MoS 2纳米膜的压裂
定制二维（2D）材料的临界应变的可能性对于制造柔性可拉伸设备至关重要。尽管结晶MoS 2单层的拉伸强度可与钢媲美，但多晶MoS 2中大量缺陷和晶界集中会显着降低其机械性能。本文探讨了多晶MoS 2的断裂使用电子显微镜在微米和纳米尺度上研究了平均晶粒尺寸低于10 nm的薄膜。水平和垂直于样品平面的具有不同厚度和晶粒取向的两个样品被测量。确定的临界单轴应变约为5％，与样品的形态无关。但是，发现电子束辐照增强了MoS 2和聚二甲基硅氧烷（PDMS）基材之间的相互作用，导致临界应变增加，可以超过10％。应变抗性的这种增强用于制造MoS 2的机械坚固阵列线长度为1毫米。最后，通过透射电子显微镜研究的纳米级裂纹扩展表明，裂纹不仅沿晶粒边界而且还沿晶粒传播，优选沿范德华平面传播。这些结果提供了对多晶2D材料断裂的洞察力以及增强临界应变的方法。
更新日期：2020-04-01
中文翻译：
多晶MoS 2纳米膜的压裂
定制二维（2D）材料的临界应变的可能性对于制造柔性可拉伸设备至关重要。尽管结晶MoS 2单层的拉伸强度可与钢媲美，但多晶MoS 2中大量缺陷和晶界集中会显着降低其机械性能。本文探讨了多晶MoS 2的断裂使用电子显微镜在微米和纳米尺度上研究了平均晶粒尺寸低于10 nm的薄膜。水平和垂直于样品平面的具有不同厚度和晶粒取向的两个样品被测量。确定的临界单轴应变约为5％，与样品的形态无关。但是，发现电子束辐照增强了MoS 2和聚二甲基硅氧烷（PDMS）基材之间的相互作用，导致临界应变增加，可以超过10％。应变抗性的这种增强用于制造MoS 2的机械坚固阵列线长度为1毫米。最后，通过透射电子显微镜研究的纳米级裂纹扩展表明，裂纹不仅沿晶粒边界而且还沿晶粒传播，优选沿范德华平面传播。这些结果提供了对多晶2D材料断裂的洞察力以及增强临界应变的方法。
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