Abstract Device grade PbI2 nanostructured thin films were developed by a cost effective sol-gel spin coating method with different (0,1,3 and 5 wt%) Nd doping concentrations on FTO substrates. Films revealed excellent structural, vibrational, electronic structure, and nonlinear optical properties on Nd doping concentrations. X-ray diffraction and vibrational spectroscopy of the specimen demonstrated an excellent crystalline quality and growth along (001) planes. Surface morphological studies of the films showed the compact and uniform distribution of particles throughout the surfaces. Also, the transformation in morphology was noticed from nanorods to nanoparticle by Nd doping content. The transmittance of the films were noticed to be ~ 70–75% in the visible region of the solar spectrum. The bandgap of the films were obtained in the range of 2.36–2.45 eV. Refractive indices n, extinction coefficient k, real and imaginary part of dielectric constant e1 and e2 were also analyzed. Third-order nonlinear optical parameters such as third-order nonlinear optical susceptibility χ(3) and second-order refractive index n(2) were obtained in range 2.10 × 10−11 – 1.54 × 10−8 esu and 5.10 × 10−10 - 9.18 × 10−8 esu over the plotted energy region.

中文翻译：

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用于光电子学的 Nd:PbI2/FTO 薄膜系统的结构、形貌和光非线性行为

摘要 器件级 PbI2 纳米结构薄膜是通过具有成本效益的溶胶-凝胶旋涂方法开发的，在 FTO 衬底上具有不同（0、1、3 和 5wt%）Nd 掺杂浓度。薄膜在 Nd 掺杂浓度上显示出优异的结构、振动、电子结构和非线性光学特性。样品的 X 射线衍射和振动光谱显示出极好的晶体质量和沿 (001) 面的生长。薄膜的表面形态研究表明颗粒在整个表面上紧密均匀分布。此外，通过 Nd 掺杂含量注意到从纳米棒到纳米颗粒的形态转变。注意到薄膜的透射率在太阳光谱的可见光区约为 70-75%。薄膜的带隙范围为 2。36–2.45 eV。还分析了折射率n、消光系数k、介电常数e1和e2的实部和虚部。在 2.10 × 10−11 – 1.54 × 10−8 esu 和 5.10 × 10−10 范围内获得了三阶非线性光学参数，例如三阶非线性光学磁化率 χ(3) 和二阶折射率 n(2) - 在绘制的能量区域上为 9.18 × 10−8 esu。