当前位置: X-MOL 学术IEEE Electron Device Lett. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Influence of Nitrogen Content on Persistent Photoconductivity in Zinc Oxynitride Thin Film Transistors
IEEE Electron Device Letters ( IF 4.9 ) Pub Date : 2020-04-01 , DOI: 10.1109/led.2020.2974757
Jun Tae Jang , Hyoung-Do Kim , Dong Myong Kim , Sung-Jin Choi , Hyun-Suk Kim , Dae Hwan Kim

In this work, the influence of anion composition on the photoresponse characteristics of zinc oxynitride thin film transistors is investigated and compared directly to conventional In-Ga-Zn-O TFTs. Increasing the ratio of N to (N+O) led to higher field effect mobility and improved subthreshold swing. The subgap density of states extracted by monochromatic photonic capacitance-voltage measurement indicated that the nitrogen-related defect states, such as nitrogen vacancies, increased with increasing nitrogen gas flow rate. Furthermore, the photoconductivity mechanism of ZnON TFTs is discussed in detail.

中文翻译:

氮含量对氮氧化锌薄膜晶体管持久光电导率的影响

在这项工作中,研究了阴离子组成对氧氮化锌薄膜晶体管光响应特性的影响,并直接与传统的 In-Ga-Zn-O TFT 进行了比较。增加 N 与 (N+O) 的比率导致更高的场效应迁移率和改善的亚阈值摆动。通过单色光子电容-电压测量提取的子能隙密度表明氮相关缺陷状态,如氮空位,随着氮气流量的增加而增加。此外,详细讨论了 ZnON TFT 的光电导机制。
更新日期:2020-04-01
down
wechat
bug