This work demonstrates a novel attempt to enhance the optical properties of fluorine doped tin oxide (FTO) by doping rare earth element yttrium (Y) in different concentrations (0-1.5 wt.%) using nebulizer spray pyrolysis technique at 450 °C. The variation in structural, morphological, optical and electrical properties of the films due to doping are analyzed using X-ray diffraction (XRD), Raman spectroscopy, Atomic force microscope (AFM), Energy dispersive X-ray analysis (EDAX), UV-visible spectroscopy, Photoluminescence and Hall Effect measurements. The prepared films are in polycrystalline nature with tetragonal structure and its crystallite size is reduced with doping. Raman analysis shows peaks at 444 cm^-1, 570 cm^-1 and 790 cm^-1 corresponding to E_g, E_u and B_2g vibrational modes for the Y-doped FTO films. AFM measurements displays a decrease in surface roughness for the doped films. Optical transmittance spectrum exhibits an increase of transmittance from 62% to 76% for the host material to 1.5 wt.% Y doped FTO with increase of band gap from 3.88 eV to 3.96 eV. The different optical constants such as refractive index, extinction coefficient, real and imaginary parts of dielectric constants are also reported. Ultraviolet emission at 370 nm is observed in PL spectra related to near band edge emission. Large carrier concentration 6.02 × 10¹⁹ cm^-3 and small resistivity value 1.97 × 10^-3 Ω-cm are observed for 1.5 wt.% Y doped FTO thin film. The obtained figure of merit value 1.9 × 10^-3 Ω^-1 is perfectly suitable for optoelectronic applications.

这项工作表明了一种新颖的尝试，即通过使用喷雾器喷雾热解技术在450°C下掺杂不同浓度（0-1.5％重量）的稀土元素钇（Y）来增强氟掺杂的氧化锡（FTO）的光学性能。使用X射线衍射（XRD），拉曼光谱，原子力显微镜（AFM），能量色散X射线分析（EDAX），UV-X射线分析了掺杂引起的薄膜结构，形态，光学和电学性质的变化可见光谱，光致发光和霍尔效应测量。所制备的膜具有四方结构的多晶性质，并且其微晶尺寸随着掺杂而减小。在444厘米拉曼分析显示峰^-1，570厘米^-1和790厘米^-1对应于Y掺杂的FTO薄膜的E _g，E _u和B _2g振动模式。AFM测量显示掺杂膜的表面粗糙度降低。随着带隙从3.88eV增加到3.96eV，光学透射光谱显示出从基质材料的透射率从62％增加到76％到Y掺杂的FTO的1.5重量％。还报道了不同的​​光学常数，例如折射率，消光系数，介电常数的实部和虚部。在与近带边缘发射有关的PL光谱中观察到370nm处的紫外线发射。较大的载流子浓度6.02×10 ¹⁹ cm ^-3和较小的电阻率值1.97×10 ^-3对于1.5重量％的Y掺杂的FTO薄膜观察到Ω-cm。将所得到的指标值1.9×10的图形^-3 Ω ^-1是完全适合的光电应用。