In this study, a novel finishing method, entitled clustered magnetorheological finish (CMRF), was proposed to improve surface finish of the silicon nitride ( ${\mathrm{Si}}_3{\mathrm{N}}_4$ ) balls with ultra fine precision. The effects of different polishing parameters including rotation speeds, eccentricities and the machining gaps on surface finish of ${\mathrm{Si}}_3{\mathrm{N}}_4$ balls were investigated by analyzing the roughness, sphericity and the micro morphology of the machined surface. The experimental results showed that the polishing parameters significantly influenced the surface finish. The best surface finish was obtained by using the polishing parameters: the machining gap of 0.8 mm, the eccentricity of 10 mm and the rotation ratio of 3/4. To further investigate the influence of the polishing parameters on the surface finish, an analytical model was also developed to analyze the kinematics of the ceramic ball during CMRF process. The resulting surface finish, as a function of different polishing parameters employed, was evaluated by analyzing the visualized finishing trace and the distribution of the contact points. The simulative results showed that the distribution and trace of the contact points changed with different polishing parameters, which was in accordance with the results of experiments.

中文翻译：

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簇状磁流变抛光抛光氮化硅陶瓷球

在这项研究中，提出了一种新颖的抛光方法，称为簇磁流变抛光（CMRF），以改善氮化硅（ ${硅}_3{\mathrm{ñ}}_4$ ）球具有超精细的精度。不同的抛光参数，包括转速，偏心率和加工间隙对表面光洁度的影响 ${硅}_3{\mathrm{ñ}}_4$ 通过分析加工表面的粗糙度，球形度和微观形态来研究钢球。实验结果表明，抛光参数显着影响表面光洁度。通过使用抛光参数可获得最佳的表面光洁度：加工间隙为0.8 mm，偏心距为10 mm，旋转比为3/4。为了进一步研究抛光参数对表面光洁度的影响，还建立了一个分析模型来分析陶瓷球在CMRF过程中的运动学。通过分析可视化的精加工痕迹和接触点的分布来评估所得到的表面光洁度，作为所采用的不同抛光参数的函数。