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Thickness-dependent frictional behavior of topological insulator Bi2Se3 nanoplates
Applied Physics A ( IF 2.5 ) Pub Date : 2020-03-19 , DOI: 10.1007/s00339-020-3452-5
Ruijian Zhu , Zengmei Wang , Quanzhou Yao , Qunyang Li , Zhenxiang Cheng , Xinli Guo , Tong Zhang , Xiaoshuai Li , Hideo Kimura , Takao Matsumoto , Naoya Shibata , Yuichi Ikuhara

Two-dimensional Bi2Se3 TIs were recently found to be the most promising room-temperature topological insulators for its relatively large bulk gap, but its surface frictional response is little investigated. Here, we prepared single-crystalline Bi2Se3 nanoplates with a lateral dimension up to ~ 1 μm and a thickness of less than 200 nm via a simple polyol method, and the molecular structure and morphology were characterized in detail using different methods. The micro-frictional behavior of Bi2Se3 nanoplates with different thickness is inventively investigated with AFM technique. The atomic stick–slip friction stemming from periodic crystal lattice, and the larger friction force of thinner nanoplates is attributed to the larger adhesion force and enhanced energy dissipation. This work has, for the first time, built the link of the behavior of topological protected surface and mechanical friction behavior of Bi2Se3.

中文翻译:

拓扑绝缘体Bi2Se3纳米片的厚度相关摩擦行为

最近发现二维 Bi2Se3 TI 因其相对较大的体隙而成为最有前途的室温拓扑绝缘体,但其表面摩擦响应鲜有研究。在这里,我们通过简单的多元醇方法制备了横向尺寸高达 ~ 1 μm、厚度小于 200 nm 的单晶 Bi2Se3 纳米片,并使用不同的方法详细表征了分子结构和形态。利用原子力显微镜技术创造性地研究了不同厚度的 Bi2Se3 纳米片的微摩擦行为。源于周期性晶格的原子粘滑摩擦,更薄的纳米片的更大摩擦力归因于更大的粘附力和增强的能量耗散。这部作品第一次
更新日期:2020-03-19
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