Abstract This paper reported a Mn1.2Co1.5Ni0.3O4 thin film humidity sensor prepared according to the DC magnetron sputtering method. Scanning electron microscopy (SEM) was conducted to determine the morphology and microstructure of the film. The crystal structure and composition of the thin film were characterized by X-ray diffraction (XRD) and energy dispersive X-ray analysis (EDS), respectively. The impedance of the film changed by three orders of magnitude within the relative humidity (RH) range of 11% to 95% RH. Moreover, the response time and recovery time were shortened to 0.3 s and 3 s, respectively, as the deposition power decreased. The above results indicated that, the as-prepared Mn1.2Co1.5Ni0.3O4 thin film was an excellent candidate for humidity sensor applications.

中文翻译：

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基于直流磁控溅射Mn1.2Co1.5Ni0.3O4薄膜的快速响应湿度传感器

摘要 本文报道了一种采用直流磁控溅射法制备的Mn1.2Co1.5Ni0.3O4薄膜湿度传感器。进行扫描电子显微镜（SEM）以确定膜的形态和微观结构。薄膜的晶体结构和成分分别通过 X 射线衍射 (XRD) 和能量色散 X 射线分析 (EDS) 表征。在 11% 至 95% RH 的相对湿度 (RH) 范围内，薄膜的阻抗变化了三个数量级。此外，随着沉积功率的降低，响应时间和恢复时间分别缩短至 0.3 秒和 3 秒。上述结果表明，所制备的 Mn1.2Co1.5Ni0.3O4 薄膜是湿度传感器应用的理想选择。