Abstract Mesostructured nickel oxide (NiO) nanoflake network films doped with zinc (Zn), tin (Sn), and iron (Fe), were grown by a one-step solution immersion method at 120⁰C on indium-doped tin oxide (ITO) glass substrates. Field emission scanning electron microscope images revealed that the NiO nanoflake networks doped with Zn, Sn, and Fe, grew on the ITO but with different nanoflake morphologies and thicknesses, and their growth mechanisms are discussed. The X-ray diffraction patterns show that all grown films exhibited polycrystalline NiO structures. Substantial modifications and anomalies in the NiO film’s morphology, thickness, lattice constant, stress/strain, crystallite size, and dislocation density, were observed when doped with the different sources. The optical and electrical properties also altered after the doping process. The Raman spectra indicated that all the films exhibited cubic NiO structures with paramagnetic characteristics. Moreover, the characteristic deviations in the doped NiO nanoflake network films have been thoroughly discussed.

中文翻译：

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介孔结构的 X 掺杂 NiO（X = Zn、Sn、Fe）纳米薄片网络薄膜的合成、结构和光学特性

摘要 通过一步溶液浸渍法在 120⁰C 下在掺铟氧化锡 (ITO) 玻璃上生长了掺杂锌 (Zn)、锡 (Sn) 和铁 (Fe) 的介观结构氧化镍 (NiO) 纳米薄片网络薄膜。基材。场发射扫描电子显微镜图像显示，掺杂有 Zn、Sn 和 Fe 的 NiO 纳米薄片网络在 ITO 上生长，但具有不同的纳米薄片形貌和厚度，并讨论了它们的生长机制。X 射线衍射图显示所有生长的薄膜都表现出多晶 NiO 结构。当用不同的源掺杂时，观察到 NiO 膜的形态、厚度、晶格常数、应力/应变、微晶尺寸和位错密度的大量修改和异常。掺杂过程后光学和电学特性也发生了变化。拉曼光谱表明所有薄膜都表现出具有顺磁特性的立方 NiO 结构。此外，掺杂的 NiO 纳米薄片网络薄膜的特性偏差已经得到了彻底的讨论。