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UV–NIR femtosecond laser hybrid lithography for efficient printing of complex on-chip waveguides
Optics Letters ( IF 3.1 ) Pub Date : 2020-03-20 , DOI: 10.1364/ol.386861
Zhi-Shan Hou , Jia-Ji Cao , Feng Yu , Zhen-Nan Tian , Xiao Xiong , Mu-Tian Li , Xi-Feng Ren , Qi-Dai Chen , Hong-Bo Sun

We propose UV–IR femtosecond laser hybrid lithography for the efficient printing of complex on-chip waveguides, which offers good performance in terms of processing efficiency and accuracy. With this three-dimensional printing technology, waveguides with complex cross-section shapes, such as owls and kittens, can be easily fabricated with an efficiency increased by 1500% (for ${6}\;\unicode{x00B5} {\rm m}\; \times \;{6}\;\unicode{x00B5} {\rm m}$). In addition, a circular cross-section waveguide with an extremely low birefringence and complex ${8} \times {8}$ random walk networks were quickly customized, which implies that in the design and preparation of the large-scale optical chips, the proposed maskless method allows for the preparation of highly customized devices.

中文翻译:

UV-NIR飞秒激光混合光刻技术,可有效打印复杂的片上波导

我们建议使用UV-IR飞秒激光混合光刻技术,以有效打印复杂的片上波导,从而在处理效率和精度方面提供良好的性能。借助这种三维打印技术,可以轻松制作出具有复杂横截面形状的波导,例如猫头鹰和小猫,效率提高了1500%(对于$ {6} \; \ unicode {x00B5} {\ rm m } \; \ times \; {6} \; \ unicode {x00B5} {\ rm m} $)。此外,具有极低双折射和复杂的{{8} \ times {8} $)随机游走网络的圆形截面波导被快速定制,这意味着在设计和制备大型光学芯片时,提出的无掩膜方法可以制备高度定制的设备。
更新日期:2020-04-01
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