Microlens arrays (MLAs) are widely used in optical imaging, dense wavelength division multiplexing, optical switching, and microstructure patterning, etc. However, the light modulation capability for both the conventional refractive-type MLA and planar diffractive-type MLA is still staying at the diffraction-limited scale. Here we propose and experimentally demonstrate a high numerical aperture (NA) supercritical lens (SCL) array which could achieve a sub-diffraction-limited focal spot lattice in the far field. The intensity distribution for all the focal spots has good uniformity with the lateral size around ${0.45}\lambda {\rm /NA}$ (0.75X Airy unit). The elementary unit in the SCL array composes a series of concentric belts with a feature size in micrometer scale. By utilizing an ultrafast ultraviolet lithography technique, a centimeter scale SCL array could be successfully patterned within 10 mins. Our results may provide possibilities for the applications in optical nanofabrication, super-resolution imaging, and ultrafine optical manipulation.

中文翻译：

---

超临界透镜阵列，厘米级，采用无掩模UV光刻技术进行图案化

微透镜阵列（MLA）广泛用于光学成像，密集波分复用，光学开关和微结构图案化等。然而，传统的折射型MLA和平面衍射型MLA的光调制能力仍然停留在衍射极限尺度。在这里，我们提出并通过实验证明了高数值孔径（NA）超临界透镜（SCL）阵列，该阵列可以在远场中实现亚衍射限制的焦点晶格。所有焦点的强度分布具有良好的均匀性，其横向尺寸约为$ {0.45} \ lambda {\ rm / NA} $（0.75倍Airy单位）。SCL阵列中的基本单元由一系列同心带组成，其特征尺寸为微米级。通过利用超快紫外光刻技术，厘米级SCL阵列可以在10分钟内成功图案化。我们的结果可能为光学纳米加工，超分辨率成像和超精细光学操作中的应用提供可能性。