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Direct silanol analysis of tribological surfaces using synchrotron radiation
Tribology International ( IF 6.2 ) Pub Date : 2020-08-01 , DOI: 10.1016/j.triboint.2020.106304
Naoko Takechi Takahashi , Noritake Isomura , Satoru Kosaka , Hiroyuki Mori , Yasuji Kimoto , Toshihide Ohmori , Takayuki Aoyama , Toshinari Sano , Fumihiro Itoigawa

Abstract A new direct detection technique for silanol is needed for tribological materials containing silicon. We focused on near-edge X-ray absorption fine structure (NEXAFS), which uses synchrotron radiation as a method for directly detecting silanol. Model samples were prepared, and their spectra were obtained by NEXAFS. The Si and the O K-edge spectra of silanol exhibited peaks at approximately 1843 eV and 535 eV, respectively. Then the surfaces of silicon-containing diamond-like carbon (DLC-Si) films were measured. The amount of silanol on high-silicon-doped DLC, which had a low friction coefficient, was found to be greater than that on low-silicon-doped DLC. In this research, we demonstrated that the silanol on the surface of DLC-Si films can be directly detected and identified by NEXAFS.

中文翻译:

使用同步辐射直接分析摩擦表面的硅烷醇

摘要 含硅摩擦学材料需要一种新的硅烷醇直接检测技术。我们专注于近边 X 射线吸收精细结构 (NEXAFS),它使用同步辐射作为直接检测硅烷醇的方法。制备模型样品,并通过 NEXAFS 获得其光谱。硅烷醇的 Si 和 O K 边缘光谱分别在大约 1843 eV 和 535 eV 处出现峰值。然后测量含硅类金刚石碳 (DLC-Si) 膜的表面。发现摩擦系数低的高硅掺杂 DLC 上的硅烷醇量大于低硅掺杂 DLC 上的硅烷醇量。在这项研究中,我们证明了 NEXAFS 可以直接检测和识别 DLC-Si 薄膜表面的硅烷醇。
更新日期:2020-08-01
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