TiO2 coatings have recently been used as corrosion resistant materials to protect metals in several environments. In this study, the microstructure, phase composition and morphology under different voltages (20, 30 and 40 V) were investigated using scanning electron microscopy (SEM), X-ray diffraction (XRD) and atomic force microscopy (AFM), respectively. The coating corrosion performance was examined by potentiodynamic polarization in 3.5 wt% NaCl solution. Experimental findings indicate that the thickness and cracks of the coating rise by increasing voltage. Energy dispersive X-ray spectroscopy results show that the atomic ratio Ti/O of the coating has an almost constant ratio. Obviously, the defects and cracks on the deposited coatings resulted in corrosive attack due to a considerable increase of the corrosion current density noticed during potentiodynamic polarization experiments. The film produced under 30 V exhibited the lowest corrosion current density ( i corr ) value of 0.21 µA cm−2 as well as the lowest corrosion potential ( E corr ) value of −111.89 mV, which was attributed mainly to the significant decrease of micro-pore density in the coating.

中文翻译：

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电泳沉积法沉积的TiO2涂层的摩擦学和腐蚀行为

TiO2 涂层最近被用作耐腐蚀材料，以在多种环境中保护金属。在这项研究中，分别使用扫描电子显微镜 (SEM)、X 射线衍射 (XRD) 和原子力显微镜 (AFM) 研究了不同电压 (20、30 和 40 V) 下的微观结构、相组成和形貌。通过在 3.5 wt% NaCl 溶液中的动电位极化检测涂层的腐蚀性能。实验结果表明，随着电压的增加，涂层的厚度和裂纹会增加。能量色散X射线光谱结果表明涂层的Ti/O原子比几乎恒定。明显地，由于在动电位极化实验中注意到腐蚀电流密度的显着增加，沉积涂层上的缺陷和裂纹导致腐蚀侵蚀。在 30 V 下制备的薄膜表现出最低的腐蚀电流密度 ( i corr ) 值为 0.21 µA cm-2 以及最低的腐蚀电位 ( E corr ) 值为 -111.89 mV，这主要归因于 micro - 涂层中的孔隙密度。