Abstract Thin-film solar absorber layer presenting its surface with periodically patterned structures or with random roughness are considered one of the ways to increase the incident light absorption and thereby enhance the performance of the solar cell. This surface modification in the absorber layer reduces the reflection loss and leads to multiple reflections of the photons that fall on the absorber layer, leading to improved absorbance. In this present work, optical lithography process has been adapted to achieve periodic micro patterning of Cu2ZnSnSe4(CZTSe) solar absorber thin film surface and the changes in optical absorbance is studied. Optimization of the lithography process is undertaken to upscale the area of patterning up to (~20 mm × 20 mm) in CZTSe absorber thin films. CZTSe films were grown using e-beam evaporation and surface patterning is integrated through lithography process. Patterning integrity was examined through optical and scanning electron microscopes. Phase integrity was studied using XRD and Raman spectroscopy tools. The optical absorbance of the flat and patterned CZTSe thin films are measured using UV–Vis-NIR spectrophotometer.

中文翻译：

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Cu2ZnSnSe4 薄膜的表面织构以提高光吸收率

摘要 薄膜太阳能吸收层表面具有周期性图案结构或随机粗糙度被认为是增加入射光吸收从而提高太阳能电池性能的方法之一。吸收层中的这种表面改性降低了反射损失，并导致落在吸收层上的光子发生多次反射，从而提高吸收率。在目前的工作中，已采用光刻工艺来实现 Cu2ZnSnSe4(CZTSe) 太阳能吸收器薄膜表面的周期性微图案化，并研究了光吸收率的变化。对光刻工艺进行优化以将 CZTSe 吸收体薄膜中的图案化区域扩大到（~20 mm × 20 mm）。CZTSe 薄膜是使用电子束蒸发生长的，表面图案化是通过光刻工艺集成的。通过光学和扫描电子显微镜检查图案完整性。使用 XRD 和拉曼光谱工具研究相完整性。使用 UV-Vis-NIR 分光光度计测量平面和图案化 CZTSe 薄膜的吸光度。