Abstract Regulating refractive index over a wide range plays a key role in the design and fabrication of broadband antireflective coating in many optical energy-related fields. In this paper, hydrophobic refractive-tunable coating was fabricated from an effective solution mixing method starting from a synthesis solution of silica (SiO2) nanoparticles which was developed for dispersing nanoparticles into dense hexylene-bridged polymethylsiloxane polymer. In the mixing process, the microstructure and chemical structure of hexylene-bridged polymethylsiloxane/SiO2 were analyzed by fourier transform-infrared spectrometer and transmission electron microscope. Specially, the relationship between the microstructure and optical properties was also well investigated. Silica nanoparticles were dispersed homogeneously in polymer matrix modulating the refractive index of composite coating ranging from 1.16 to 1.47. When the composite coating with refractive index of 1.36 was used as the bottom layer and hexamethyldisilazane modified SiO2 coating with refractive index of 1.16 was used as the top layer. Thus-obtained double-layer broadband antireflective coating was fabricated with excellent broadband antireflective performance. In addition, the double-layer broadband silica antireflective coating showed good environmental stability. This work provides an alternative way to prepare a broadband antireflective coating for some applications in energy harvesting and optical devices.

中文翻译：

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具有可调折射率的透明疏水己烯桥联聚甲基硅氧烷/SiO2复合涂层及其在宽带抗反射中的应用

摘要 在宽范围内调节折射率在许多光能相关领域的宽带抗反射涂层的设计和制造中起着关键作用。在本文中，疏水性折射可调涂层是通过一种有效的溶液混合方法制造的，该方法从二氧化硅 (SiO2) 纳米粒子的合成溶液开始，该溶液被开发用于将纳米粒子分散到致密的己烯桥联聚甲基硅氧烷聚合物中。在混合过程中，通过傅里叶变换红外光谱仪和透射电子显微镜分析了己烯桥联聚甲基硅氧烷/SiO2的微观结构和化学结构。特别是，微观结构和光学性能之间的关系也得到了很好的研究。二氧化硅纳米粒子均匀分散在聚合物基质中，调节复合涂层的折射率，范围为 1.16 至 1.47。当使用折射率为1.36的复合涂层作为底层，使用折射率为1.16的六甲基二硅氮烷改性SiO2涂层作为顶层时。由此获得的双层宽带抗反射涂层具有优异的宽带抗反射性能。此外，双层宽带二氧化硅抗反射涂层表现出良好的环境稳定性。这项工作提供了一种替代方法，可以为能量收集和光学设备中的某些应用制备宽带抗反射涂层。36用作底层，六甲基二硅氮烷改性SiO2涂层，折射率为1.16，用作顶层。由此获得的双层宽带抗反射涂层具有优异的宽带抗反射性能。此外，双层宽带二氧化硅抗反射涂层表现出良好的环境稳定性。这项工作提供了一种替代方法，可以为能量收集和光学设备中的某些应用制备宽带抗反射涂层。36用作底层，六甲基二硅氮烷改性SiO2涂层，折射率为1.16，用作顶层。由此获得的双层宽带抗反射涂层具有优异的宽带抗反射性能。此外，双层宽带二氧化硅抗反射涂层表现出良好的环境稳定性。这项工作提供了一种替代方法，可以为能量收集和光学设备中的某些应用制备宽带抗反射涂层。