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Cross‐Linked Fluorinated Poly(Aryl Ether) (C‐FPAE) Films: Preparation Strategy, Performance Study, and Low Dielectric Applications
Macromolecular Materials and Engineering ( IF 4.2 ) Pub Date : 2020-03-12 , DOI: 10.1002/mame.201900866
Zhaoyang Wang 1 , Yingshuang Shang 1 , Xiaocui Han 1 , Qixing Yan 1 , Jie Liu 1 , Zilong Jiang 1 , Haibo Zhang 1
Affiliation  

The production of low dielectric materials that can be used in high temperature environments is the primary aim of this work. A cross‐linked structure is introduced into fluorinated poly(aryl ether) (named as FPAE) with high molecular weight (Mw, 140 000 g mol−1) and linear molecular structure using nucleophilic substitution reaction at the ortho‐position of decafluorobiphenyl monomer units in the FPAE molecular chain. The curing temperature and curing time are optimized and the final conditions for the cross‐linking reaction in this study are determined to be 300 °C for 1 h. Moreover, the dielectric constant and dielectric loss of the C‐FPAE film respectively are 2.67 and 0.006 at 1000 Hz when 1 wt% of crosslinking agent is added, and the cross‐linked fluorinated poly(aryl ether) film shows excellent thermal stability (Td(5%), 495 °C), dimensional stability, hydrophobic properties, and high storage modulus in high temperature environments. Such novel low dielectric material with excellent performances has important application value in the aerospace and the integrated electronics field.

中文翻译:

交联氟化聚(芳醚)(C-FPAE)薄膜:制备策略,性能研究和低介电应用

可以在高温环境中使用的低介电材料的生产是这项工作的主要目标。将交联结构引入具有高分子量(M w,140 000 g mol -1的氟化聚(芳基醚)(称为FPAE))和线性分子结构,在FPAE分子链中十氟联苯单体单元的邻位使用亲核取代反应。优化了固化温度和固化时间,并确定了本研究中交联反应的最终条件为300°C 1 h。此外,当添加1 wt%的交联剂时,C-FPAE薄膜在1000 Hz下的介电常数和介电损耗分别为2.67和0.006,交联的氟化聚芳醚薄膜表现出出色的热稳定性(T d(5%),495°C),尺寸稳定性,疏水性和高温环境下的高储能模量。这种性能优异的新型低介电材料在航空航天和集成电子领域具有重要的应用价值。
更新日期:2020-03-12
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