当前位置: X-MOL 学术Anal. Chim. Acta › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Determination of trace elements in high-purity quartz samples by ICP-OES and ICP-MS: A normal-pressure digestion pretreatment method for eliminating unfavorable substrate Si
Analytica Chimica Acta ( IF 5.7 ) Pub Date : 2020-05-01 , DOI: 10.1016/j.aca.2020.03.006
Xuelin Dong , Yuxiang Xiong , Nan Wang , Zhou Song , Jie Yang , Xiumei Qiu , Lihua Zhu

The analysis of siliceous matrix samples may adopt a two-step pretreatment, which includes melting with ammonium hydrogen fluoride and redissolving with nitric acid. However, the residual of substrate silicon unfavorable to the determination of trace elements in the samples due to serious matrix effects. Here, a new digestion method using simultaneously both ammonium bifluoride and nitric acid under normal pressure was developed for high-purity quartz sand sample. The digestion pretreatment is a two step process: melting/dissolving with both ammonium bifluoride and nitric acid at 200 °C for 2 h, and evaporating the solution at 250 °C to dryness. As confirmed by XRD analysis, silicates in the sample were converted to (NH4)3SiF6NO3 in the melting/dissolving step. TGA analysis shows that the generated (NH4)3SiF6NO3 could be decomposed and evaporated completely at 250 °C, which ensured a complete removal of silicon by the followed evaporation of the solution at 250 °C. As a result, the followed ICP-OES and ICP-MS analysis needed a solution dilution of only 100 times for the determination of Ca, Mg, Al, Rb, Ba, REE and other trace elements. The new method was applied to the analysis of three certified reference materials, and the results were well consistent with the standard value with RSD% values between 0.62% and 9.73%. Therefore, this method can be applied to the analysis of trace elements in high purity silica-based samples, with the advantages of time-saving, small dilution factor (only 100 times) and low detection limit.

中文翻译:

ICP-OES 和 ICP-MS 测定高纯石英样品中的痕量元素:一种去除不利底物 Si 的常压消解预处理方法

硅质基质样品的分析可采用两步预处理,包括用氟化氢铵熔化和用硝酸重新溶解。然而,基质硅的残留由于严重的基质效应不利于样品中微量元素的测定。在这里,开发了一种在常压下同时使用氟化氢铵和硝酸的新消解方法,用于高纯石英砂样品。消化预处理是一个两步过程:用氟化氢铵和硝酸在 200°C 下熔化/溶解 2 小时,然后在 250°C 下将溶液蒸发至干。XRD 分析证实,样品中的硅酸盐在熔化/溶解步骤中转化为 (NH4)3SiF6NO3。TGA 分析表明,生成的 (NH4)3SiF6NO3 可以在 250°C 下完全分解和蒸发,确保通过随后在 250°C 下蒸发溶液来完全去除硅。因此,后续的 ICP-OES 和 ICP-MS 分析只需将溶液稀释 100 倍即可测定 Ca、Mg、Al、Rb、Ba、REE 和其他微量元素。将新方法应用于三种有证标准物质的分析,结果与标准值一致,RSD%值在0.62%~9.73%之间。因此,该方法具有省时、稀释倍数小(仅100倍)、检出限低等优点,可用于高纯硅胶基样品中痕量元素的分析。这确保通过随后在 250 °C 下蒸发溶液来完全去除硅。因此,后续的 ICP-OES 和 ICP-MS 分析只需将溶液稀释 100 倍即可测定 Ca、Mg、Al、Rb、Ba、REE 和其他微量元素。将新方法应用于三种有证标准物质的分析,结果与标准值一致,RSD%值在0.62%~9.73%之间。因此,该方法具有省时、稀释倍数小(仅100倍)、检出限低等优点,可用于高纯硅胶基样品中微量元素的分析。这确保通过随后在 250 °C 下蒸发溶液来完全去除硅。因此,后续的 ICP-OES 和 ICP-MS 分析只需将溶液稀释 100 倍即可测定 Ca、Mg、Al、Rb、Ba、REE 和其他微量元素。将新方法应用于三种有证标准物质的分析,结果与标准值一致,RSD%值在0.62%~9.73%之间。因此,该方法具有省时、稀释倍数小(仅100倍)、检出限低等优点,可用于高纯硅胶基样品中微量元素的分析。REE等微量元素。将新方法应用于三种有证标准物质的分析,结果与标准值一致,RSD%值在0.62%~9.73%之间。因此,该方法具有省时、稀释倍数小(仅100倍)、检出限低等优点,可用于高纯硅胶基样品中微量元素的分析。REE等微量元素。将新方法应用于三种有证标准物质的分析,结果与标准值一致,RSD%值在0.62%~9.73%之间。因此,该方法具有省时、稀释倍数小(仅100倍)、检出限低等优点,可用于高纯硅胶基样品中微量元素的分析。
更新日期:2020-05-01
down
wechat
bug