Since the discovery of graphene, there has been an ever-increasing interest in two-dimensional (2D) layered materials with exceptional properties. To this end, a variety of synthesis methods have been developed. However, it is still challenging to produce large-scale high-quality single-crystalline 2D materials. In this regard, atomic layer deposition (ALD) has recently shown great promise and has stimulated more and more research efforts, ascribed to its unique growth mechanism and distinguished capabilities to achieve nanoscale films with excellent uniformity, unrivaled conformality, and atomic-scale controllability. This review comprehensively summarizes recent progress on ALD for 2D atomic sheets, including 25 different materials and more than 80 ALD processes. This work highlights different technical routes to ALD, their precise controllability, and their underlying principles for 2D materials. It is expected that this work will help boost more research efforts for controllable growth of high-quality 2D materials via ALD.

自从发现石墨烯以来，人们对具有优异性能的二维（2D）层状材料的兴趣日益增长。为此，已经开发了多种合成方法。但是，生产大规模高质量的单晶2D材料仍然具有挑战性。在这方面，原子层沉积（ALD）最近显示出巨大的希望并刺激了越来越多的研究工作，这归因于其独特的生长机理和卓越的能力，以实现具有出色的均匀性，无与伦比的保形性和原子级可控性的纳米级薄膜。这篇综述全面总结了二维原子片ALD的最新进展，包括25种不同材料和80多种ALD工艺。这项工作重点介绍了通往ALD的不同技术路线，它们的精确可控性以及2D材料的基本原理。预计这项工作将有助于推动更多的研究工作，以通过ALD可控地增长高质量2D材料。