Refractive Index Contrast Polymers: Photoresponsive Systems with Spatial Modulation of Refractive Index for Photonics,ACS Macro Letters

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Refractive Index Contrast Polymers: Photoresponsive Systems with Spatial Modulation of Refractive Index for Photonics
ACS Macro Letters ( IF 5.1 ) Pub Date : 2020-03-02 , DOI: 10.1021/acsmacrolett.9b00919
Tristan S Kleine ₁ , Julie I Frish ₂ , Nicholas G Pavlopoulos ₁ , Sasaan A Showghi ₂ , Roland Himmelhuber ₂ , Robert A Norwood ₂ , Jeffrey Pyun _{1,

3}

Affiliation

The development of an intriguing concept using optical polymers for photonics is reported to enable modulation of refractive index (RI) in solution cast thin films with precise spatial control. While extensive efforts in polymer science have focused on methods to prepare optically transparent polymers with high RI, the creation of photoresponsive polymer systems to spatially adjust the refractive index upon irradiation is a distinct technical challenge requiring development of materials amenable to this process. The ability to create refractive index contrast (i.e., a difference in RI between two domains) is a critical capability required in photonics for the fabrication of integrated photonics devices, such as, polymer waveguides. In this report, we detail the synthesis of optical polymers tailored to this application, termed Refractive Index Contrast (RIC) polymers, in which the RI of the material can be photopatterned where UV exposure in the presence of a photoacid generator resulted in a permanent increase of RI in the exposed regions thus creating regions of high RIC. This process creates the high RI core of waveguides in a single step and lends itself to rapid fabrication of photonic devices via direct laser writing. Waveguides made from RIC polymers were found to have propagation losses of ∼2 dB/cm at 1550 nm.

中文翻译：

折射率对比聚合物：用于光子学的具有折射率空间调制的光响应系统

据报道，使用用于光子学的光学聚合物开发了一个有趣的概念，可以通过精确的空间控制来调制溶液流延薄膜中的折射率 (RI)。虽然聚合物科学的广泛努力集中在制备具有高 RI 的光学透明聚合物的方法上，但创建光响应聚合物系统以在照射时对折射率进行空间调整是一项明显的技术挑战，需要开发适合该过程的材料。产生折射率对比的能力（即两个域之间的 RI 差异）是光子学中制造集成光子器件（例如聚合物波导）所需的关键能力。在本报告中，我们详细介绍了为该应用量身定制的光学聚合物的合成，称为折射率对比 (RIC) 聚合物，其中材料的 RI 可以被光图案化，其中在光产酸剂存在下的 UV 曝光导致曝光区域的 RI 永久增加，从而产生高 RIC 区域。这个过程在一个步骤中创建了波导的高 RI 核心，并有助于通过直接激光写入快速制造光子器件。发现由 RIC 聚合物制成的波导在 1550 nm 处的传播损耗约为 2 dB/cm。这个过程在一个步骤中创建了波导的高 RI 核心，并有助于通过直接激光写入快速制造光子器件。发现由 RIC 聚合物制成的波导在 1550 nm 处的传播损耗约为 2 dB/cm。这个过程在一个步骤中创建了波导的高 RI 核心，并有助于通过直接激光写入快速制造光子器件。发现由 RIC 聚合物制成的波导在 1550 nm 处的传播损耗约为 2 dB/cm。

更新日期：2020-03-03

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