Simultaneous measurement of negative ion source plasma and extracted beam is carried out in order to clarify a key plasma parameter governing the meniscus formation in negative ion sources for fusion. The plasma discharge is performed with various discharge powers at different bias voltages in order to vary the plasma parameters. It is shown that the beam width changes along the same curve with respect to the negative ion density at any bias voltage while it varies along different curves with other plasma parameters depending on the bias voltage. This implies that the mechanism of meniscus formation in negative ion sources could be described along the similar manner as positive ion sources.

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等离子体参数与光束光学的相关性研究

进行负离子源等离子体和提取束的同时测量，以阐明控制聚变负离子源中弯液面形成的关键等离子体参数。等离子体放电是在不同的偏置电压下以不同的放电功率进行的，以改变等离子体参数。结果表明，在任何偏置电压下，束宽相对于负离子密度沿同一曲线变化，而随着其他等离子体参数的不同，它根据偏置电压沿不同曲线变化。这意味着负离子源中弯液面形成的机制可以按照与正离子源类似的方式来描述。