A photolithographic process for the rapid fabrication of thin-film tensile-test structures is presented. The process is applicable to various physical vapor deposition techniques and can be used for the combinatorial fabrication of thin-film tensile-test structure materials libraries for the high-throughput characterization of mechanical properties. The functionality of the fabrication process and the feasibility of performing high-quality measurements with these structures are demonstrated with Cu tensile-test structures. In addition, the scalability from unary structures to libraries with compositional variations is demonstrated.

中文翻译：

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用于机械性能高通量表征的薄膜微拉伸试验结构。

提出了一种用于快速制造薄膜拉伸测试结构的光刻工艺。该方法适用于各种物理气相沉积技术，并且可用于薄膜拉伸测试结构材料库的组合制造，以高通量表征机械性能。铜拉伸测试结构证明了制造工艺的功能性以及使用这些结构进行高质量测量的可行性。此外，还展示了从一元结构到具有组成变化的库的可伸缩性。