Endowing quantum dots (QDs) with robustness and durability have been one of the most important issues in this field, since the major limitations of QDs in practical applications are their thermal and oxidative instabilities. In this work, we propose a facile and effective passivation method to enhance the photochemical stability of QDs using polymeric double shell structures from thiol-terminated poly(methyl methacrylate-b-glycidyl methacrylate) (P(MMA-b-GMA)-SH) block copolymer ligands. To generate a densely cross-linked network, the cross-linking reaction of GMA epoxides in the PGMA block was conducted using a Lewis acid catalyst under an ambient environment to avoid affecting the photophysical properties of the pristine QDs. This provides QDs encapsulated with robust double layers consisting of highly transparent PMMA outer-shell and oxidation-protective cross-linked inner shell. Consequently, the resulting QDs exhibited exceptional tolerance to heat and oxidants when dispersed in organic solvents or QD-nanocomposite films, as demonstrated under various harsh conditions with respect to temperature and oxidant species. The present approach not only provides simple yet effective chemical means to enhance the thermochemical stability of QDs, but also offers a promising platform for the hybridization of QDs with polymeric materials for developing robust light-emitting or light-harvesting devices.

赋予量子点（QD）坚固性和耐用性一直是该领域最重要的问题之一，因为在实际应用中QD的主要局限性在于其热和氧化不稳定性。在这项工作中，我们提出了一种简便有效的钝化方法，该方法使用巯基封端的聚（甲基丙烯酸甲酯-b-甲基丙烯酸缩水甘油酯）（P（MMA- b-GMA）-SH）嵌段共聚物配体。为了产生密集的交联网络，在周围环境下使用路易斯酸催化剂在PGMA嵌段中进行GMA环氧化物的GMA环氧化物的交联反应，以避免影响原始QD的光物理性质。这提供了封装有坚固双层的QD，双层由高度透明的PMMA外壳和防氧化的交联内壳组成。因此，如在温度和氧化剂种类的各种苛刻条件下所证明的，所得的QD在分散在有机溶剂或QD-纳米复合膜中时表现出对热和氧化剂的出色耐受性。本方法不仅提供了简单而有效的化学方法来增强量子点的热化学稳定性，