Abstract We developed a collinear reflection Mueller matrix microscope by adding polarization state generator (PSG) and polarization state analyzer (PSA) into the illumination and detection optical paths of a commercial metallurgical microscope. It is found that specific efforts have to be made to reduce the artifacts due to the intrinsic polarizations of the optical system, particularly the dichroism due to the 45° beam splitter. We adopt a new calibration method based on numerical reconstruction of the instrument matrix to minimize the artifacts of the beam splitter. Using a reflection mirror as the sample, maximum error in the calibrated Mueller matrix elements is smaller than 0.02. Preliminary test results using electrospinning samples show that the collinear reflection Mueller matrix microscope can effectively minimize the dependence of Mueller matrix to azimuth orientations and enhance the capability for characterizing the microstructural features of anisotropic samples.

中文翻译：

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用于反向散射穆勒矩阵成像的共线反射穆勒矩阵显微镜

摘要 我们通过在商用金相显微镜的照明和检测光路中加入偏振态发生器（PSG）和偏振态分析仪（PSA），开发了共线反射穆勒矩阵显微镜。发现必须做出特别努力来减少由于光学系统的固有偏振引起的伪影，特别是由于 45° 分束器引起的二色性。我们采用了一种基于仪器矩阵数值重建的新校准方法，以最大限度地减少分束器的伪影。以反射镜为样本，校准后的穆勒矩阵元素的最大误差小于0.02。