We report the photocatalytic properties of ZnO and Cu₂O thin films deposited on glass substrates at room temperature by DC sputtering and pulsed laser deposition. The photoactivity of the films was investigated through the degradation of rhodamine B (RhB) and methyl orange (MO) under solar light. In order to select the most suitable film of ZnO for the of RhB and MO degradation, the relationship between the characteristics (e.g. energy levels and defects concentration) of ZnO films and their effectiveness in the photocatalytic yield of RhB and MO been studied, where several films were deposited by using different oxygen partial pressures (P_O2: 0.05–1.3 mbar), while Cu₂O films were grown under a pressure of 0.01 mbar. The XRD patterns show that all ZnO films have (002) preferential orientation, and crystallite size increases from 73 to 122 nm raising P_O2. The gap E_g of ZnO (3.26 and 4.15 eV) depends on P_O2, and the films present photoluminescence emission in the UV–Vis-near IR region. On the basis of structural, optical and electrical characterizations of both films, a comparative study was carried out on the dyes degradation. Cu₂O films exhibit a high photoactivity with MO (81.69%) under solar light (6 h), whilst for RhB the best elimination rate (60.85%) was achieved with ZnO films deposited at 0.1 mbar, which were also the ones exhibiting the highest PL peak intensity at the characteristic absorption wavelength of RhB (553 nm).

我们报告了通过直流溅射和脉冲激光沉积在室温下沉积在玻璃基板上的ZnO和Cu ₂ O薄膜的光催化性能。通过在阳光下降解若丹明B（RhB）和甲基橙（MO）来研究薄膜的光活性。为了选择最合适的ZnO膜用于RhB和MO的降解，研究了ZnO膜的特性（例如能级和缺陷浓度）与其对RhB和MO的光催化产率的影响之间的关系，其中有几个膜是通过使用不同的氧气分压（P _O2：0.05–1.3 mbar）沉积的，而Cu ₂O膜在0.01mbar的压力下生长。XRD图谱表明，所有ZnO薄膜都具有（002）优先取向，微晶尺寸从73nm增加到122nm，提高了P _O2。ZnO的间隙E _g（3.26和4.15 eV）取决于P _O2，并且薄膜在UV-Vis附近的IR区域呈现光致发光。根据两种薄膜的结构，光学和电学特性，对染料的降解进行了比较研究。铜₂O膜在太阳光下（6 h）表现出对MO的高光活性（81.69％），而对于RhB，在0.1 mbar沉积的ZnO膜实现了最佳的去除率（60.85％），这也是PL最高的膜RhB的特征吸收波长（553 nm）处的最大强度。