High power impulse magnetron sputtering (HiPIMS) of a cobalt cathode in argon gas was investigated by time-resolved electrical (Langmuir) probe diagnostics and by time-integrated energy-resolved mass spectrometry. The HiPIMS discharge was operated with a bipolar pulsed power supply, providing a large negative voltage with a typical pulse width of 100 μs followed by a long positive pulse with a pulse width of about 310 μs. The time-resolved Langmuir probe results yield a small negative plasma potential in the negative pulse regime and a large positive floating potential and plasma potential in the positive pulse regime. The electron density is significantly reduced during the positive pulse regime. The probe results are supported by ion energy measurements.

中文翻译：

---

双极高功率脉冲磁控溅射放电的时间分辨朗缪尔探针诊断

通过时间分辨电 (Langmuir) 探针诊断和时间积分能量分辨质谱法研究了氩气中钴阴极的高功率脉冲磁控溅射 (HiPIMS)。HiPIMS 放电使用双极脉冲电源进行操作，提供典型脉冲宽度为 100 μs 的大负电压，然后是脉冲宽度约为 310 μs 的长正脉冲。时间分辨朗缪尔探针结果在负脉冲状态下产生一个小的负等离子体电位，在正脉冲状态下产生一个大的正浮动电位和等离子体电位。在正脉冲状态期间电子密度显着降低。离子能量测量支持探针结果。