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Facile and accelerated production of RuO2 monolayers via a dual-step intercalation process
Inorganic Chemistry Frontiers ( IF 6.1 ) Pub Date : 2020/02/13 , DOI: 10.1039/c9qi01678c
Se Yun Kim 1, 2, 3, 4 , Weon Ho Shin 4, 5, 6, 7 , Doh Won Jung 1, 2, 3, 4 , Dong-Su Ko 2, 3, 4, 8 , Jong Wook Roh 4, 9, 10, 11 , Sungwoo Hwang 1, 2, 3, 4 , Jongmin Lee 1, 2, 3, 4 , Kimoon Lee 4, 12, 13, 14 , Hee Jung Park 4, 15, 16, 17 , Chan Kwak 1, 2, 3, 4 , Sang-il Kim 4, 15, 18, 19 , Hyung Mo Jeong 4, 20, 21, 22 , Kyu Hyoung Lee 4, 7, 15, 23 , Hyun Sik Kim 4, 15, 24, 25
Affiliation  

Tetrabutylammonium ions (TBA+) have commonly been used to exfoliate RuO2 into monolayers via ion exchange reactions. However, the low production yield of RuO2 exfoliation, which originates from the large molecular size of TBA+, limits wider utilisation of RuO2 monolayers in optoelectronic applications. We introduce a rapid and efficient dual-step exfoliation process beginning with intercalation of small organic molecules (tetramethylammonium ions) into RuO2, which is followed by the addition of TBA+ as a second intercalant to realize RuO2 monolayer production. Our dual-step intercalation process increases the RuO2 monolayer exfoliation yield from 9.9% to 60% after 14 days. Density functional theory calculations reveal that the activation energy of dual-step intercalation is much lower than that of direct intercalation of TBA+ ions into the RuO2 structure. The experimental and theoretical results of dual-step intercalation suggest that it is a facile and general approach for the production of metal oxide monolayers, and could widen the use of metal oxide monolayer nanosheets.

中文翻译:

通过两步插入过程轻松快速地生产RuO2单层

四丁基铵离子(TBA +)通常用于通过离子交换反应将RuO 2剥离成单层。然而,由于TBA +的分子大小大,RuO 2剥落的产率低,限制了RuO 2单层在光电应用中的广泛利用。我们引入了一种快速有效的双步剥落工艺,该过程首先是将小的有机分子(四甲基铵离子)插入RuO 2中,然后添加TBA +作为第二种插入剂以实现RuO 2单层生产。14天后,我们的双步插入过程将RuO 2单层剥落率从9.9%提高到60%。密度泛函理论计算表明,双步嵌入的活化能远低于将TBA +离子直接嵌入RuO 2结构的活化能。双步插层的实验和理论结果表明,这是一种生产金属氧化物单层的简便通用方法,可以扩大金属氧化物单层纳米片的用途。
更新日期:2020-03-19
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