Analysis of plant samples by low-power total reflection X-ray fluorescence spectrometry applying argon-peak normalization,Journal of Analytical Atomic Spectrometry

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Analysis of plant samples by low-power total reflection X-ray fluorescence spectrometry applying argon-peak normalization
Journal of Analytical Atomic Spectrometry ( IF 3.1 ) Pub Date : 2020-01-26 , DOI: 10.1039/c9ja00419j
Jinfa Shao _{1,

2,

3,

4} , Wenbao Jia _{1,

2,

3,

4,

5} , Xinlei Zhang _{1,

2,

3,

4} , Yong Liu _{1,

2,

3,

4} , Xinru Tang _{1,

2,

3,

4} , Genchao Xiong _{1,

2,

3,

4} , Qing Shan _{1,

2,

3,

4,

5}

Affiliation

A method was established for the determination of the elemental composition in plant samples using the characteristic argon fluorescence peak in the air as a normalization standard via low power total reflection X-ray fluorescence (LP-TXRF) spectrometry using polychromatic X-ray excitation. The source of the Ar peak was demonstrated both theoretically and experimentally. According to the theoretical study, the characteristic Ar peak mainly originates from the optical path of the incident and reflected X-rays and the standing wave field formed by the incident and reflected X-rays. Additionally, the experiments confirmed the main contribution of the standing wave fields formed by the incident and reflected X-rays to the Ar characteristic peaks, and the influence of reflector type and sample deposition amount on the Ar characteristic peaks was excluded. Three different plant certified reference materials (CRMs) were employed to evaluate the effectiveness of the proposed methodology for multi-elemental quantitative analysis. The results showed that the Ar-peak normalization method resulted in comparable accuracy and precision compared with the conventional internal standard method, and a long-term stability check under the same conditions showed the good stability of the argon peak.

中文翻译：

氩峰归一化低功率全反射X射线荧光光谱法分析植物样品

建立了以空气中的特征氩荧光峰为归一化标准的测定植物样品中元素组成的方法。使用多色X射线激发的低功率全反射X射线荧光（LP-TXRF）光谱。从理论上和实验上都证明了Ar峰的来源。根据理论研究，特征Ar峰主要来自入射和反射X射线的光路以及入射和反射X射线形成的驻波场。此外，实验证实了入射X射线和反射X射线形成的驻波场对Ar特征峰的主要贡献，并且排除了反射器类型和样品沉积量对Ar特征峰的影响。三种不同的工厂认证参考材料（CRM）被用来评估所提出的用于多元素定量分析的方法的有效性。

更新日期：2020-01-26

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